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METHOD FOR CLEANING ELEMENTS IN VACUUM CHAMBER AND APPARATUS FOR PROCESSING SUBSTRATES

  • US 20080245388A1
  • Filed: 06/02/2008
  • Published: 10/09/2008
  • Est. Priority Date: 08/25/2003
  • Status: Abandoned Application
First Claim
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1. An element cleaning method which causes particles sticking to an element in a vacuum chamber to scatter, whereinby applying a voltage to said element, the particles sticking to said element are caused to scatter in accordance with a permittivity difference between said element and said particles.

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