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Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device

  • US 20080252865A1
  • Filed: 06/09/2008
  • Published: 10/16/2008
  • Est. Priority Date: 06/21/2004
  • Status: Abandoned Application
First Claim
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1. A method for preventing or reducing contamination of an immersion type projection apparatus, the apparatus comprising at least one immersion space that is at least partially filled with a liquid when the apparatus projects a beam of radiation onto a substrate, the method comprising:

  • rinsing at least part of the immersion space with a rinsing liquid before the apparatus is used to project the beam of radiation onto a substrate.

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