Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device
First Claim
1. A method for preventing or reducing contamination of an immersion type projection apparatus, the apparatus comprising at least one immersion space that is at least partially filled with a liquid when the apparatus projects a beam of radiation onto a substrate, the method comprising:
- rinsing at least part of the immersion space with a rinsing liquid before the apparatus is used to project the beam of radiation onto a substrate.
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Accused Products
Abstract
An exposure apparatus forms an immersion area of a liquid on the side of the image plane of a projection optical system and performs exposure of a substrate via the projection optical system and the liquid of the immersion region. The exposure apparatus has an optical cleaning unit which irradiates a predetermined irradiation light, having an optical cleaning effect, onto, for example, the upper surface of the substrate stage which makes contact with the liquid for forming the immersion area. Thus, it is possible to prevent deterioration of the exposure accuracy and measurement accuracy due to pollution of the member in contact with the liquid in the immersion region.
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Citations
49 Claims
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1. A method for preventing or reducing contamination of an immersion type projection apparatus, the apparatus comprising at least one immersion space that is at least partially filled with a liquid when the apparatus projects a beam of radiation onto a substrate, the method comprising:
rinsing at least part of the immersion space with a rinsing liquid before the apparatus is used to project the beam of radiation onto a substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. A method for preventing or reducing contamination of a lithographic projection apparatus, the apparatus including a substrate holder constructed to hold a substrate, a patterning device holder constructed to hold a patterning device, a projection system, and an immersion system configured to at least partially fill an immersion space of the apparatus with a liquid, the method comprising:
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moving at least one of the immersion system and at least part of the apparatus relative to each other; and rinsing said at least part of the apparatus with the liquid before the apparatus is used to project a patterned beam of radiation onto a target portion of a substrate. - View Dependent Claims (13, 14, 15, 16)
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17. A method for preventing or reducing contamination of a lithographic projection apparatus, the apparatus including an immersion space, the method comprising:
filling at least part of the immersion space with a rinsing liquid for at least one minute. - View Dependent Claims (18)
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19. A method for preventing or reducing contamination of a lithographic projection apparatus, the apparatus including a substrate holder constructed to hold a substrate, a patterning device holder constructed to hold a patterning device, a projection system, and an immersion space, the method comprising:
filling at least part of the immersion space with a rinsing liquid during an idle time of the apparatus to prevent or reduce substrate contamination during at least one subsequent start-up run of the apparatus. - View Dependent Claims (20)
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21. An immersion type lithographic apparatus comprising:
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at least one immersion space; and an immersion system configured to at least partially fill the immersion space with a liquid, wherein the apparatus is configured to rinse at least part of the immersion space with a rinsing liquid before the apparatus is used to project a patterned beam of radiation onto a substrate. - View Dependent Claims (22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39, 40, 41, 42, 43, 44)
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45. An immersion type lithographic apparatus, including at least one storage space or compartment to store at least one dummy substrate or substrate-shaped object in-situ.
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46. An immersion type lithographic apparatus, including at least one storage space or compartment to store at least one dummy patterning device or patterning device-shaped object in-situ.
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47. A computer program containing one or more sequences of machine-readable instructions configured to carry out a method for preventing or reducing contamination of an immersion type projection apparatus when the computer program is being executed by a computer, the apparatus comprising at least one immersion space that is at least partially filled with a liquid when the apparatus projects a beam of radiation onto a substrate, the method comprising rinsing at least part of the immersion space with a rinsing liquid before the apparatus is used to project the beam of radiation onto a substrate.
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48. A method for preventing or reducing contamination of a lithographic projection apparatus comprising a space that is to be provided with a liquid through which a beam of radiation can be transmitted, the method comprising:
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operating the lithographic apparatus; and subsequently rinsing at least part of the space with a rinsing liquid. - View Dependent Claims (49)
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Specification