EXPOSURE APPARATUS AND DEVICE FABRICATION METHOD
First Claim
1. An exposure apparatus comprising:
- an illumination optical system configured to illuminate a reticle with a light beam from a light source; and
a projection optical system which is configured to project a pattern of the reticle onto a substrate, and has a numerical aperture of not less than 0.7,said projection optical system including an optical member on which an antireflection coating configured to suppress reflection of the light beam is formed and which is arranged closest to the substrate,wherein a reflectance of said antireflection coating with respect to the light beam is minimum at an incident angle of not less than 30°
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Accused Products
Abstract
The present invention provides an exposure apparatus comprising an illumination optical system configured to illuminate a reticle with a light beam from a light source, and a projection optical system which is configured to project a pattern of the reticle onto a substrate, and has a numerical aperture of not less than 0.7, the projection optical system including an optical member on which an antireflection coating configured to suppress reflection of the light beam is formed and which is arranged closest to the substrate, wherein a reflectance of the antireflection coating with respect to the light beam is minimum at an incident angle of not less than 30°.
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Citations
15 Claims
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1. An exposure apparatus comprising:
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an illumination optical system configured to illuminate a reticle with a light beam from a light source; and a projection optical system which is configured to project a pattern of the reticle onto a substrate, and has a numerical aperture of not less than 0.7, said projection optical system including an optical member on which an antireflection coating configured to suppress reflection of the light beam is formed and which is arranged closest to the substrate, wherein a reflectance of said antireflection coating with respect to the light beam is minimum at an incident angle of not less than 30°
. - View Dependent Claims (2, 3, 4, 5, 6, 13)
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7. An exposure apparatus comprising:
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an illumination optical system configured to illuminate a reticle with a light beam from a light source; and a projection optical system which is configured to project a pattern of the reticle onto a substrate, and has a numerical aperture of not less than 0.7, said projection optical system including an optical member on which an antireflection coating configured to suppress reflection of the light beam is formed and which is arranged closest to the substrate, wherein a reflectance of said antireflection coating with respect to an S-polarized light component of the light beam is minimum at an incident angle of not less than 30°
. - View Dependent Claims (8, 14)
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9. An exposure apparatus comprising:
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a projection optical system which is configured to project a pattern of a reticle onto a substrate, and has a numerical aperture of not less than 0.7; and a light-shielding unit which is interposed between said projection optical system and the substrate, and is configured to shield flare light, wherein said projection optical system includes an optical member arranged closest to the substrate, and wherein said optical member has, as a surface on a side of the reticle, a concave surface with a curvature radius of 1000 mm (inclusive) to 10000 mm (inclusive). - View Dependent Claims (10, 11, 12, 15)
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Specification