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Film Formation Apparatus, Film Formation Method, Manufacturing Apparatus, and Method for Manufacturing Light-Emitting Device

  • US 20080260938A1
  • Filed: 12/03/2007
  • Published: 10/23/2008
  • Est. Priority Date: 12/05/2006
  • Status: Active Grant
First Claim
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1. A film formation apparatus comprising:

  • a film formation chamber;

    a heat source provided in the film formation chamber;

    a first supporting unit to hold a first substrate over the heat source; and

    a second supporting unit to hold a second substrate over the first supporting unit,wherein a first layer containing a material is formed on one flat surface of the first substrate set on the first supporting unit, andwherein the first substrate is heated by the heat source to form a second layer containing the material on a lower flat surface of the second substrate facing downward opposite to the first substrate.

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