Photocatalytic Substrate Active Under a Visible Light

• US 20080261056A1
• Filed: 04/12/2005
• Published: 10/23/2008
• Est. Priority Date: 04/13/2004
• Status: Abandoned Application

• Current Assignee: Saint-Gobain Glass France (Compagnie De Saint-Gobain)
• Original Assignee: Saint-Gobain Glass France (Compagnie De Saint-Gobain)
• Inventors: Labrousse, Laurent, Gueneau, Lethicia, Kharchenko, Andriy
• Application Number:
  US11/578,035
• Publication Number:
  US 20080261056A1
• Time in Patent Office: Days
• US Class Current: 428/447
• CPC Class Codes: C03C 17/007 containing a dispersed phase, e.g. particles, fibres or flakes, in a continuous phase
• CPC Class Codes: C03C 2217/425 consisting of a porous layer
• CPC Class Codes: C03C 2217/45 Inorganic continuous phases
• CPC Class Codes: C03C 2217/479 Metals
• CPC Class Codes: C03C 2217/71 Photocatalytic coatings
• CPC Class Codes: C03C 8/12 containing titanium or zirconium
• CPC Class Codes: Y10T 428/31663 As siloxane, silicone or silane

Abstract

The invention relates to a substrate provided with a mechanically resistant, long-lasting coating, and suitable for being handled by a user. Said substrate is characterised in that the coating comprises a first photocatalytic compound which is intimately associated with a second compound containing an energy jump between the upper level of the valence band thereof and the lower level of the conductive band thereof, corresponding to a wavelength in the visible field. The invention also relates to a glazing comprising said substrate, to the applications of the inventive substrate, and to the methods for the production thereof.

Claims

1. A substrate with a mechanically strong and durable coating allowing handling by a user, characterized in that the coating comprises, in intimate association, a photocatalytic first compound and a second compound having a bandgap, between the upper level of its valence band and the lower level of its conduction band, corresponding to a wavelength in the visible range.

2. The substrate as claimed in claim 1, characterized in that said bandgap of the second compound is between 1.55 eV and 3.26 eV.

3. The substrate as claimed in claim 2, characterized in that said second compound is chosen from GaP, CdS, KTa_0.77Nb_0.23O₃, CdSe, SrTiO₃, TiO₂, ZnO, Fe₂O₃, WO₃, Nb₂O₅, V₂O₅ and Eu₂O₃.

4. The substrate as claimed in one of claims 1 to 3, characterized in that it is transparent and its antisoiling/hydrophilic functionality is of a nature so as to maintain its high initial transparency and optical quality exclusively under visible light.

5. The substrate as claimed in claim 4, characterized in that it is made of glass, at least one surface part of which, oriented toward said coating, is dealkalized.

6. The substrate as claimed in one of the preceding claims, characterized in that said coating has a mesoporous structure.

7. The substrate as claimed in one of the preceding claims, characterized in that particles, especially metal particles based on cadmium, tin, tungsten, zinc, cerium or zirconium, are incorporated into said coating.

8. The substrate as claimed in one of claims 1 to 6, characterized in that at least one of the metal elements chosen from niobium, tantalum, iron, bismuth, cobalt, nickel, copper, ruthenium, cerium and molybdenum is inserted into the crystal lattice of said photocatalytic first compound.

9. The substrate as claimed in one of claims 1 to 6, characterized in that at least one part of said coating is covered with a layer of oxides or of metal salts, the metal being chosen from iron, copper, ruthenium, cerium, molybdenum, vanadium and bismuth.

10. The substrate as claimed in one of claims 1 to 6, characterized in that said photocatalytic first compound, or at least one part of said coating, is covered with a noble metal in the form of a thin film of the platinum, rhodium, silver or palladium type.

11. The substrate as claimed in one of the preceding claims, characterized in that the thickness of said coating is between 2 nm and 1 μ

m, especially between 5 nm and 100 nm, and preferably not exceeding 80 nm.

12. The substrate as claimed in one of the preceding claims, characterized in that the RMS roughness of the coating (3) is between 0.2 and 20 nm.

13. The substrate as claimed in one of the preceding claims, characterized in that at least one thin film having an antistatic, thermal or optical function, or forming a barrier to the migration of alkalis coming from the substrate, is deposited beneath said coating.

14. The substrate as claimed in claim 13, characterized in that said thin film having an antistatic function, possibly with controlled polarization, and/or having a thermal and/or optical function is based on a conducting material of the metal type or doped metal oxide type, such as ITO, SnO₂:

F, ZnO;

In, ZnO;

F, ZnO;

Al, ZnO;

Sn, or a metal oxide substoichiometric in oxygen, such as SnO_2-x or ZnO_2-x, where x<

2.

15. The substrate as claimed in claim 13, characterized in that said thin film having an optical function is based on an oxide or a mixture of oxides, the refractive index of which is intermediate between that of the coating and that of the substrate, the oxide(s) being especially chosen from the following oxides:

Al₂O₃, SnO₂, In₂O₃ and silicon oxycarbide or oxynitride.

16. The substrate as claimed in claim 13, characterized in that said thin film having an alkali metal barrier function is based on silicon oxide, nitride, oxynitride or oxycarbide, Al₂O₃:

F or aluminum nitride.

17. The substrate as claimed in claim 13, characterized in that said coating constitutes the final layer of an antireflection multilayer stack.

18. Antisoiling and/or hydrophilic, monolithic, multiple (of the double-glazing type) or laminated glazing incorporating the substrate as claimed in one of the preceding claims.

19. The application of the substrate as claimed in one of claims 1 to 17 to the manufacture of hydrophilic and/or antisoiling, self-cleaning glazing, of the type for removing organic and/or mineral soiling, especially glazing for buildings, of the double-glazing type, vehicle glazing, of the automobile windshield, rear window or side window type, glazing for trains, aircraft and water-borne vehicles or utilitarian glazing, such as glass for aquaria, shop windows, greenhouses or porches, glass for interior furnishings, such as tables, shelves, staircase treads, walls in any position, said glass optionally having surface irregularities, especially being printed, textured, satined, sanded, lacquered or varnished, ophthalmic glass, glazing for urban furniture, mirrors, television, telephone or similar screens, glazing having electronically controlled variable absorption, covers for lamps, of the flat lamp or tunnel lamp type, or any architectural material, of the curtain wall, cladding or roofing type, such as tiles, rendering.

20. A process for obtaining the substrate as claimed in one of claims 1 to 17, characterized in that said coating is deposited by liquid pyrolysis, especially from a solution comprising at least one precursor of said photocatalytic first compound, especially a titanium organometallic precursor of the titanium chelate and/or titanium alcoholate type, and a precursor of said second compound.

21. A process for obtaining the substrate as claimed in one of claims 1 to 17, characterized in that said coating is deposited by a sol-gel technique, with a deposition mode of the dip-coating, cell-coating, spray-coating or laminar flow-coating type, using a solution comprising at least said photocatalytic first compound and said second compound and/or a precursor of said photocatalytic first compound, especially a titanium organometallic precursor of the titanium alcoholate type, and a precursor of said second compound.

22. A process for obtaining the substrate as claimed in one of claims 1 to 17, characterized in that said coating is deposited by chemical vapour deposition (CVD) from at least one precursor of said photocatalytic first compound, especially a titanium precursor of the halogen or organometallic type, and a precursor of said second compound.

23. A process for obtaining the substrate as claimed in one of claims 1 to 17, characterized in that said coating is deposited by a reduced-pressure technique, such as reactive or nonreactive sputtering, especially magnetron sputtering.