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PHOTOMASK WITH DETECTOR FOR OPTIMIZING AN INTEGRATED CIRCUIT PRODUCTION PROCESS AND METHOD OF MANUFACTURING AN INTEGRATED CIRCUIT USING THE SAME

  • US 20080261127A1
  • Filed: 04/18/2008
  • Published: 10/23/2008
  • Est. Priority Date: 04/20/2007
  • Status: Active Grant
First Claim
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1. A photomask for integrated circuit production for development of integrated circuit components, the integrated circuit production using a radiation source that generates a source image, the photomask comprising:

  • a substrate with one or more layers disposed thereon;

    a source separator element that separates the source image into one or more duplicate source images;

    one or more polarizing elements each corresponding to one of the one or more duplicate source images; and

    one or more sensors each corresponding to one of the one or more polarizing elements, the one or more sensors sensing one or more radiation characteristics of the radiation source.

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