INTERSPINOUS PROCESS CUSHIONED SPACER

• US 20080262619A1
• Filed: 04/18/2007
• Published: 10/23/2008
• Est. Priority Date: 04/18/2007
• Status: Abandoned Application

• Current Assignee: Novarra Incorporated (Nokia Corporation)
• Original Assignee: Novarra Incorporated (Nokia Corporation)
• Inventors: Ray, Charles D.
• Application Number:
  US11/737,012
• Publication Number:
  US 20080262619A1
• Time in Patent Office: Days
• US Class Current: 623/17.11
• CPC Class Codes: A61B 17/7062 Devices acting on, attached to, or simulating the effect of, vertebral processes, vertebral facets or ribs rib fixation devices A61B17/8076; Tools for such devices
• CPC Class Codes: A61B 17/842 Flexible wires, bands or straps A61B17/72, A61B17/82, A61B17/86 take precedence

Abstract

An implantable dorsal spinous process spacer device including an implant body having a central portion, opposed superior legs, and opposed inferior legs. The central portion defines a lateral passage extending between, and exteriorly open to, left and right sides thereof. Optional cushions are affixed to opposite faces of the central portion, within receiving zones defined thereby. The implant body is attached to adjacent spinous processes. The implanted device spreads apart the posterior vertebral structures relieving a variety of disabling spine problems that have resulted from degenerative disc collapse. A narrow non-absorbable woven band, strap or plurality of suture filaments is passed around the two spinous processes, crossing through a lateral passage provided in the implant, stabilizing the spinal segment.

Claims

1. An interspinous process spacer implant device adapted to be inserted between two adjacent spinous processes, the implant device comprising:

an implant body including;

a central portion defining a left side, a right side, an anterior face, and a posterior face;

opposing first and second superior legs extending upwardly from the central portion in a spaced fashion to define a superior zone for receiving a spinous process;

opposing first and second inferior legs extending downwardly from the central portion in a spaced fashion to define an inferior zone for receiving a spinous process;

wherein the central portion is adapted to support spinous processes disposed within the superior and inferior zones, respectively, and forms a continuous, lateral passage extending through the central portion such that the lateral passage is open at both the left and right sides.

2. The implant device of claim 1, wherein the lateral passage is sized to receive a band.

3. The implant device of claim 2, further comprising:

a band adapted for assembly through the lateral passage and about at least the first and second superior legs.

4. The implant device of claim 3, wherein the band is further adapted for assembly about the first and second inferior legs.

5. The implant device of claim 4, wherein the band is adapted for assembly about the inferior legs and the superior legs, and through the lateral passage in a figure-8 manner.

6. The implant device of claim 3, wherein the lateral passage and the band are sized such that at least two segments of the band can simultaneously be disposed within the lateral passage.

7. The implant device of claim 3, wherein the first superior leg forms a continuation of the left side of the central portion and the second superior leg forms a continuation of the right side of the central portion, each of the superior legs terminating at a tip opposite the central portion, and further wherein each of the superior legs forms a groove at the tip for receiving the band.

8. The implant device of claim 3, wherein the band is a suture.

9. The implant device of claim 1, wherein the central portion further defines a superior face between the first and second superior legs, the implant device further comprising:

a superior cushion affixed to the superior face, the superior cushion defining an abutment surface adapted to contact a spinous process disposed within the superior zone.

10. The implant device of claim 9, wherein the superior cushion is formed of a material that is softer than a material of the implant body.

11. The implant device of claim 10, wherein the superior cushion is an elastomeric rubber.

12. The implant device of claim 9, wherein the central portion further defines an inferior face between the first and second inferior legs, the implant device further comprising:

an inferior cushion affixed to the inferior face, the inferior cushion defining an abutment surface adapted to contact a spinous process disposed within the inferior zone.

13. The implant device of claim 1, wherein the first superior leg and the first inferior leg form a continuation of the left side of the central portion, the second superior leg and the second inferior leg form a continuation of the right side of the central portion such that the legs and the central portion combine to define an H-shape.

14. The implant device of claim 13, wherein the central portion is characterized by the absence of an opening extending continuously through and between the anterior and posterior faces.

15. A kit for repairing a damaged vertebral column including adjacent vertebral segments each having a posterior spinous process, the kit comprising:

first and second interspinous process spacer implant devices, each comprising;

an implant body including;

a central portion defining a left side, a right side, an anterior face, and a posterior face;

opposing first and second superior legs extending upwardly from the central portion in a spaced fashion to define a superior zone for receiving a spinous process;

opposing first and second inferior legs extending downwardly from the central portion in a spaced fashion to define an inferior zone for receiving a spinous process;

wherein the central portion is adapted to support spinous processes disposed within the superior and inferior zones, respectively, and forms a continuous, lateral passage extending through the central portion such that the lateral passage is open at both the left and right sides;

wherein a lateral spacing between the superior legs of the first implant device is greater than a lateral spacing between the superior legs of the second implant device.

16. The kit of claim 15, further comprising:

a band adapted for assembly to either of the first and second implant devices, including extension through the corresponding lateral passage.

17. The kit of claim 15, further comprising:

a bone shaping tool including a trough-like blade end.

18. The kit of claim 17, wherein the trough-like blade end defines a lateral spacing commensurate with a lateral spacing between the superior legs of the first implant device.

19. A method of repairing a damaged vertebral column including adjacent superior and inferior vertebral segments each having a posterior spinous process, the method comprising:

providing an interspinous process spacer implant device comprising an implant body including a central portion, opposing superior legs, and opposing inferior legs, wherein the superior legs extend upwardly from the central portion in a spaced fashion to define a superior zone, and the inferior legs extend downwardly from the central portion in spaced fashion to define an inferior zone;

positioning the spinous process of the superior vertebral segment within the superior zone;

positioning the spinous process of the inferior vertebral segment within the inferior zone; and

passing a band through the lateral passage and about the superior legs to secure the implant device to the superior vertebral segment;

wherein upon final implant the implant device establishes and maintains a spacing between the vertebral segments.

20. The method of claim 19, wherein passing the band includes:

extending a first segment of the band through the lateral passage;

extending a second segment of the band around the superior legs and the spinous process of the superior vertebral segment;

extending a third segment of the band through the lateral passage such that the first and third segments co-exist within the lateral passage; and

extending a fourth segment of the band about the inferior legs and the spinous process of the inferior vertebral segment.