Substrate and negative imaging method for providing transparent conducting patterns
First Claim
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1. A process for making a transparent conducting pattern comprising:
- (a) providing a substrate comprising;
a base film and a transparent conducting layer disposed on the base film wherein the substrate has an OD of about 0.1 to 0.6 at 830 nm, and the transparent conducting layer has an average OD of less than 0.1 in the range of 400 to 700 nm;
(b) contacting the substrate with a receiver, wherein the receiver comprises a base film, to provide an assemblage;
(c) exposing a portion of the assemblage to an IR light beam to provide an exposed substrate having at least one exposed region, and at least one unexposed region having the transparent conducting pattern; and
an exposed receiver;
wherein a ratio of the surface electrical resistance of the exposed region and unexposed region is at least 1000;
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Abstract
Provided are processes for making a transparent conducting pattern. The invention is also directed to electronic devices containing such transparent conducting patterns. Further provided is a substrate comprising a base film and a transparent conducting layer disposed on the base film; wherein the substrate has an OD of about 0.1 to 0.6 at 830 nm, and the transparent conducting layer comprises polyethylene dioxythiophene and has an OD of less than 0.1 in the range of 400 to 700 nm.
40 Citations
29 Claims
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1. A process for making a transparent conducting pattern comprising:
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(a) providing a substrate comprising;
a base film and a transparent conducting layer disposed on the base film wherein the substrate has an OD of about 0.1 to 0.6 at 830 nm, and the transparent conducting layer has an average OD of less than 0.1 in the range of 400 to 700 nm;(b) contacting the substrate with a receiver, wherein the receiver comprises a base film, to provide an assemblage; (c) exposing a portion of the assemblage to an IR light beam to provide an exposed substrate having at least one exposed region, and at least one unexposed region having the transparent conducting pattern; and
an exposed receiver;
wherein a ratio of the surface electrical resistance of the exposed region and unexposed region is at least 1000;
1. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22)
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- 23. A substrate comprising a base film and a transparent conducting layer disposed on the base film, wherein the substrate has an OD of about 0.1 to 0.6 at 830 nm, and the transparent conducting layer comprises polyethylene dioxythiophene and has an OD of less than 0.1 in the range of 400 to 700 nm.
Specification