Magnetic Levitation Lithography Apparatus and Method
First Claim
1. An apparatus, comprising:
- a second structure;
a first structure; and
a magnetic support configured to support the first structure adjacent the second structure, the magnetic support including;
a first magnet element, coupled to the first structure, having a first magnet polarization;
a second magnet element, coupled to the second structure, having a second magnet polarization perpendicular to the first magnet polarization, the first magnet element being separated from the second magnet element by a gap; and
an adjustment mechanism being configured to adjust the magnetic force used to support the first structure by varying the gap between the first magnet element and the second magnet element.
1 Assignment
0 Petitions
Accused Products
Abstract
A magnetic levitation lithography machine having a low spring stiffness to minimize disturbances of the first structure and which is capable of dynamically controlling the first structure in one or more degrees of freedom. The machine includes a radiation source, a patterning element configured to define a pattern, a projection element, the projection element configured to project the pattern onto a substrate when radiation from the radiation source is projected through the projection element; and a substrate take configured to support the substrate. The substrate take includes a second structure, a fine stage, and a magnetic support configured to support the fine stage adjacent the second structure. The magnetic support includes a first magnet element, coupled to the fine stage, having a first magnet polarization, a second magnet element, coupled to the course stage, having a second magnet polarization, the first magnet element being separated from the second magnet element by a gap, and an adjustment mechanism configured to adjust the magnetic force used to support the fine stage by varying the gap between the first magnet element and the second magnet element.
-
Citations
31 Claims
-
1. An apparatus, comprising:
-
a second structure; a first structure; and a magnetic support configured to support the first structure adjacent the second structure, the magnetic support including; a first magnet element, coupled to the first structure, having a first magnet polarization; a second magnet element, coupled to the second structure, having a second magnet polarization perpendicular to the first magnet polarization, the first magnet element being separated from the second magnet element by a gap; and an adjustment mechanism being configured to adjust the magnetic force used to support the first structure by varying the gap between the first magnet element and the second magnet element. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 29, 30, 31)
-
-
21. An apparatus that supports a first structure relative to a second structure, comprising:
-
a first assembly that includes a first magnetic member having a first magnetic polarization; and a second assembly that includes a second magnetic member having a second magnetic polarization;
whereinthe direction of the first magnetic polarization of the first magnetic member is substantially parallel to a support direction of the first assembly; a cross section of the first magnetic member cut by a plane perpendicular to the support direction has a circular outer periphery; the second magnetic member surrounds at least an outer surface of a part of the first magnetic member with a gap; the direction of the second magnetic polarization is different from the direction of the first magnetic polarization; the first magnetic member and the second magnetic member present magnetic force therebetween; and one of the first assembly and the second assembly is connected to the first structure and the other of the first assembly and the second assembly is connected to the second structure. - View Dependent Claims (22, 23, 24, 25, 26, 27, 28)
-
Specification