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Magnetic Levitation Lithography Apparatus and Method

  • US 20080266037A1
  • Filed: 05/20/2005
  • Published: 10/30/2008
  • Est. Priority Date: 06/17/2004
  • Status: Abandoned Application
First Claim
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1. An apparatus, comprising:

  • a second structure;

    a first structure; and

    a magnetic support configured to support the first structure adjacent the second structure, the magnetic support including;

    a first magnet element, coupled to the first structure, having a first magnet polarization;

    a second magnet element, coupled to the second structure, having a second magnet polarization perpendicular to the first magnet polarization, the first magnet element being separated from the second magnet element by a gap; and

    an adjustment mechanism being configured to adjust the magnetic force used to support the first structure by varying the gap between the first magnet element and the second magnet element.

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