Exposure Apparatus, Exposure Method, and Method for Producing Device

• US 20080266533A1
• Filed: 06/09/2005
• Published: 10/30/2008
• Est. Priority Date: 06/10/2004
• Status: Active Grant

• Current Assignee: Nikon Corporation, Nikon Engineering Co. Ltd. (Nikon Corporation)
• Original Assignee: Nikon Corporation, Nikon Engineering Co. Ltd. (Nikon Corporation)
• Inventors: Nagasaka, Hiroyuki, Okuyama, Takeshi
• Granted Patent: US 8,482,716 B2
• Time in Patent Office: Days
• US Class Current: 355/30
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/70833 Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
• CPC Class Codes: G03F 7/7085 Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
• CPC Class Codes: G03F 7/70883 of optical system

Abstract

Exposure apparatus exposes a substrate by irradiating the substrate with exposure light via a projection optical system and a liquid. The exposure apparatus is provided with a liquid immersion mechanism for supplying the liquid and recovering the liquid. The liquid immersion mechanism has an inclined surface, which is opposite to a surface of the substrate and is inclined with respect to the surface of the substrate, and a liquid recovering port of the liquid immersion mechanism is formed in the inclined surface. A flat portion is provided between the substrate and the projection optical system. A liquid immersion area can be maintained to be small.

Claims

1. An exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate through a liquid, the exposure apparatus comprising:

a projection optical system; and

a liquid immersion mechanism which supplies the liquid and which recovers the liquid, wherein;

the liquid immersion mechanism has an inclined surface which is opposite to a surface of the substrate and which is inclined with respect to the surface of the substrate, and a liquid recovery port of the liquid immersion mechanism is formed on the inclined surface.

2. The exposure apparatus according to claim 1, wherein the inclined surface is formed so that a distance between the inclined surface and the surface of the substrate is increased at positions separated farther from an optical axis of the exposure light beam.

3. The exposure apparatus according to claim 1, wherein the inclined surface is formed to surround a projection area onto which the exposure light beam is radiated.

4. The exposure apparatus according to claim 3, wherein the liquid immersion mechanism has a wall portion at a circumferential edge of the inclined surface to suppress leakage of the liquid.

5. The exposure apparatus according to claim 1, wherein the liquid recovery port is formed to surround a projection area onto which the exposure light beam is radiated.

6. The exposure apparatus according to claim 1, wherein a porous member is arranged in the liquid recovery port.

7. The exposure apparatus according to claim 6, wherein the porous member includes a mesh.

8. The exposure apparatus according to claim 1, wherein the liquid immersion mechanism has a flat portion which is formed between the inclined surface and a projection area irradiated with the exposure light beam so that the flat portion is substantially in parallel to the surface of the substrate and the flat portion is formed continuously to the inclined surface, and the flat portion is formed to surround the projection area onto which the exposure light beam is radiated.

9. The exposure apparatus according to claim 1, wherein the liquid immersion mechanism includes a member which has an opening, through which the exposure light beam passes, and which is arranged so that a predetermined gap is formed between the member and an end surface of the projection optical system, and the liquid is supplied to the gap formed between the projection optical system and the member.

10. The exposure apparatus according to claim 9, wherein the member has a flat portion which is formed opposite to the surface of the substrate.

11. The exposure apparatus according to claim 10, wherein the flat portion is formed to surround a projection area onto which the exposure light beam is radiated.

12. The exposure apparatus according to claim 10, wherein the liquid immersion mechanism has a groove which is arranged outside the flat portion, and the groove is communicated therein with a gas around an image plane of the projection optical system.

13. The exposure apparatus according to claim 12, wherein the groove is formed to surround a projection area onto which the exposure light beam is radiated.

14. The exposure apparatus according to claim 1, wherein the liquid immersion mechanism has a groove which is arranged between the inclined surface and a projection area onto which the exposure light beam is radiated, the groove has an opening which is arranged opposite to the substrate, and the groove is communicated therein with a gas around an image plane of the projection optical system.

15. The exposure apparatus according to claim 14, wherein the groove is formed to surround the projection area.

16. The exposure apparatus according to claim 1, wherein the inclined surface includes a plurality of inclined surfaces which are inclined at different angles with respect to the surface of the substrate.

17. The exposure apparatus according to claim 1, wherein the inclined surface is inclined at an angle of 3 to 20 degrees with respect to the surface of the substrate.

18. The exposure apparatus according to claim 1, wherein an entire surface of the inclined surface is the liquid recovery port.

19. The exposure apparatus according to claim 1, wherein a fin is provided on the inclined surface.

20. The exposure apparatus according to claim 1, wherein the liquid immersion mechanism continues supply and recovery of the liquid during exposure for the substrate.

21. An exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate through a liquid, the exposure apparatus comprising:

a projection optical system; and

a liquid immersion mechanism which supplies the liquid and which recovers the liquid, wherein;

the liquid immersion mechanism has a flat portion which is formed opposite to a surface of the substrate and which is formed to be substantially in parallel to the surface of the substrate;

the flat portion of the liquid immersion mechanism is arranged to surround a projection area onto which the exposure light beam is radiated, between the substrate and an end surface on a side of an image plane of the projection optical system; and

a liquid supply port of the liquid immersion mechanism is arranged outside the flat portion with respect to the projection area onto which the exposure light beam is radiated.

22. The exposure apparatus according to claim 21, wherein a liquid recovery port of the liquid immersion mechanism is arranged outside the flat portion with respect to the projection area to surround the flat portion.

23. The exposure apparatus according to claim 21, wherein a liquid recovery port of the liquid immersion mechanism is arranged outside the liquid supply port with respect to the projection area.

24. The exposure apparatus according to claim 22, wherein the liquid immersion mechanism has an inclined surface which is formed opposite to the surface of the substrate, and the liquid recovery port of the liquid immersion mechanism is formed on the inclined surface.

25. The exposure apparatus according to claim 24, wherein the inclined surface is formed so that a distance between the inclined surface and the surface of the substrate is increased at positions separated farther from an optical axis of the exposure light beam.

26. The exposure apparatus according to claim 24, wherein the liquid immersion mechanism has a wall portion at a circumferential edge of the inclined surface to suppress leakage of the liquid.

27. The exposure apparatus according to claim 22, wherein a porous member is arranged in the liquid recovery port.

28. The exposure apparatus according to claim 21, wherein the liquid immersion mechanism has a plate-shaped member formed with an opening through which the exposure light beam passes, and the plate-shaped member is arranged so that the plate-shaped member is opposite to the surface of the substrate, while one surface of the plate-shaped member serves as the flat portion.

29. The exposure apparatus according to claim 21, wherein the liquid immersion mechanism continues supply and recovery of the liquid during exposure for the substrate.

30. An exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate through a liquid, the exposure apparatus comprising:

a projection optical system; and

a liquid immersion mechanism which supplies the liquid and which recovers the liquid, wherein the liquid immersion mechanism includes;

a liquid supply port which is provided at a first position disposed outside an optical path space for the exposure light beam and which supplies the liquid; and

a guide member which guides the liquid so that the liquid, supplied from the liquid supply port, flows toward a second position via the optical path space, the second position being different from the first position disposed outside the optical path space.

31. The exposure apparatus according to claim 30, wherein the guide member is arranged so as to prevent a gas from remaining in the liquid in the optical path space for the exposure light beam.

32. The exposure apparatus according to claim 30, wherein the guide member makes the liquid to flow so that no vortex flow is formed in the optical path space.

33. The exposure apparatus according to claim 30, wherein the guide member has an opening which is arranged on a side of an image plane of the projection optical system and through which the exposure light beam passes.

34. The exposure apparatus according to claim 33, wherein the opening is substantially cross-shaped.

35. The exposure apparatus according to claim 33, wherein the liquid supply port supplies the liquid to an internal space including a space between the projection optical system and the guide member.

36. The exposure apparatus according to claim 30, wherein the guide member has a flat portion which is arranged opposite to the substrate.

37. The exposure apparatus according to claim 36, wherein:

the flat portion is arranged to surround the exposure light beam; and

the liquid immersion mechanism includes a liquid recovery port which is arranged opposite to the substrate and outside the flat portion with respect to an optical path for the exposure light beam.

38. The exposure apparatus according to claim 30, wherein the liquid supply port is arranged on each of both sides with the optical path space being intervened therebetween.

39. The exposure apparatus according to claim 30, wherein a gas discharge port is arranged at the second position or in the vicinity thereof.

40. The exposure apparatus according to claim 39, wherein the gas discharge port is connected to a gas around an image plane of the projection optical system.

41. The exposure apparatus according to claim 39, wherein the gas discharge port is connected to a suction system.

42. The exposure apparatus according to claim 39, wherein the gas discharge port includes gas discharge ports which are provided on both sides respectively with the optical path space being intervened therebetween.

43. The exposure apparatus according to claim 30, wherein the guide member includes a first guide portion which forms a flow directed from the first position to the optical path space, and a second guide portion which forms a flow directed from the optical path space to the second position, and a flow passage, which is formed by the first guide portion, intersects a flow passage which is formed by the second guide portion.

44. The exposure apparatus according to claim 43, wherein a substantially cross-shaped opening is formed by the first guide portion and the second guide portion.

45. The exposure apparatus according to claim 44, wherein the exposure light beam passes through a central portion of the substantially cross-shaped opening.

46. The exposure apparatus according to claim 43, wherein a width of the flow passage formed by the first guide portion is substantially same as a width of the flow passage formed by the second guide portion.

47. The exposure apparatus according to claim 43, wherein a width of the flow passage formed by the second guide portion is smaller than a width of the flow passage formed by the first guide portion.

48. The exposure apparatus according to claim 30, wherein a flow passage for the liquid flowing from the first position via the optical path space to the second position is bent.

49. The exposure apparatus according to claim 48, wherein the flow passage for the liquid is bent at the optical path space or in the vicinity thereof.

50. An exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate through a liquid, the exposure apparatus comprising:

an optical system which has an end surface opposite to the substrate and through which the exposure light beam to be radiated onto the substrate passes; and

a liquid immersion mechanism which supplies the liquid and which recovers the liquid, wherein;

the liquid immersion mechanism includes a plate member which is arranged opposite and in parallel to the substrate between the substrate and the end surface of the optical system and which has a flat surface arranged to surround an optical path for the exposure light beam; and

the liquid is supplied, to a space between the plate member and the end surface of the optical system, from a supply port which is provided in the vicinity of the end surface of the optical system, and the liquid is recovered from a liquid recovery port which is arranged opposite to the substrate at a position separated farther from the optical path for the exposure light beam than the flat surface of the plate member.

51. The exposure apparatus according to claim 50, wherein the plate member has a first surface which is opposite to the end surface of the optical system, and a second surface which is opposite to the substrate.

52. The exposure apparatus according to claim 50, wherein the supply port is arranged on each of both sides of the optical path for the exposure light beam.

53. The exposure apparatus according to claim 50, wherein a gas is suppliable from the supply port to the space between the plate member and the end surface of the optical system.

54. The exposure apparatus according to claim 50, wherein the liquid immersion mechanism has an opening which is different from the supply port and which is connected to the space between the plate member and the end surface of the optical system.

55. The exposure apparatus according to claim 54, wherein a gas is discharged via the opening from the space between the plate member and the end surface of the optical system.

56. The exposure apparatus according to claim 54, wherein the liquid is recovered via the opening from the space between the plate member and the end surface of the optical system.

57. The exposure apparatus according to claim 56, wherein the liquid is recovered through the opening such that an optical path space for the exposure light beam is in a non-liquid immersion state.

58. The exposure apparatus according to claim 54, wherein the opening is connected to a suction mechanism.

59. The exposure apparatus according to claim 54, wherein the opening is capable of supplying a gas to the space between the plate member and the end surface of the optical system.

60. The exposure apparatus according to claim 50, wherein the plate member has an opening having a predetermined shape through which the exposure light beam passes, in accordance with a shape of an irradiation area of the exposure light beam.

61. The exposure apparatus according to claim 60, wherein:

the plate member has the opening through which the exposure light beam passes; and

the liquid, which is supplied to the space between one surface of the plate member and the end surface of the optical member, is capable of flowing into a space between the other surface of the plate member and the substrate via the opening.

62. The exposure apparatus according to claim 61, wherein the supply port is arranged at a position above the flat surface of the plate member.

63. The exposure apparatus according to claim 50, wherein the supply port feeds the liquid in a direction parallel to the substrate.

64. The exposure apparatus according to claim 50, wherein a space between the substrate and the end surface of the optical system is filled with the liquid by continuing supply of the liquid from the supply port and recovery of the liquid from the recovery port during exposure for the substrate.

65. The exposure apparatus according to claim 50, wherein the liquid immersion mechanism has an inclined surface which is inclined with respect to the flat surface of the plate member and is disposed outside the flat surface with respect to the optical path for the exposure light beam.

66. The exposure apparatus according to claim 65, wherein the recovery port is formed on the inclined surface.

67. The exposure apparatus according to claim 65, wherein the recovery port is formed outside the inclined surface with respect to the optical path for the exposure light beam.

68. The exposure apparatus according to claim 65, wherein the liquid immersion mechanism is capable forming an interface of a liquid immersion area formed on a part of the substrate, between the inclined surface and the substrate.

69. The exposure apparatus according to claim 65, wherein the inclined surface is inclined at an angle of 3 to 20 degrees with respect to the flat surface.

76. The exposure apparatus according to claim 50, wherein a porous member is arranged in the recovery port.

77. The exposure apparatus according to claim 76, wherein only the liquid is recovered from the recovery port without being accompanied by a gas.

78. A method for producing a device, comprising using the exposure apparatus as defined in claim 50.

70. An exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate through a liquid, the exposure apparatus comprising:

an optical member which has an end surface making contact with the liquid and through which the exposure light beam passes; and

a liquid immersion mechanism which supplies the liquid and which recovers the liquid, wherein;

the liquid immersion mechanism includes a flat surface which is arranged opposite and in parallel to the substrate to surround an optical path for the exposure light beam, and an inclined surface which is inclined with respect to the flat surface and is disposed outside the flat surface with respect to the optical path for the exposure light beam.

71. The exposure apparatus according to claim 70, wherein the flat surface and the inclined surface are formed continuously.

72. The exposure apparatus according to claim 70, wherein the liquid immersion mechanism is capable of forming an interface of a liquid immersion area formed on a part of the substrate, between the inclined surface and the substrate.

73. The exposure apparatus according to claim 70, wherein the inclined surface is inclined at an angle of 3 to 20 degrees with respect to the flat surface.

74. The exposure apparatus according to claim 70, wherein the liquid immersion mechanism has a recovery port which is arranged opposite to the substrate.

75. The exposure apparatus according to claim 74, wherein the recovery port is formed outside the inclined surface with respect to the optical path for the exposure light beam.

83. The exposure apparatus according to claim 74, wherein a porous member is arranged in the recovery port.

84. The exposure apparatus according to claim 83, wherein only the liquid is recovered from the recovery port without being accompanied by a gas.

85. A method for producing a device, comprising using the exposure apparatus as defined in claim 70.

79. An exposure method for exposing a substrate by radiating an exposure light beam onto the substrate via an optical member and a liquid, the exposure method comprising:

arranging the substrate so that the substrate is opposite to an end surface of the optical member;

supplying the liquid to a space between the end surface of the optical member and one surface of a plate member arranged to surround an optical path for the exposure light beam between the substrate and the end surface of the optical member so as to fill, with the liquid, a space between the substrate and the end surface of the optical member and a space between the substrate and the other surface of the plate member;

forming a liquid immersion area on a part of the substrate by recovering the liquid from a recovery port arranged opposite to the substrate concurrently with supply of the liquid; and

exposing the substrate by radiating the exposure light beam onto the substrate through the liquid with which the liquid immersion area is formed on the part of the substrate.

80. The exposure method according to claim 79, wherein the other surface of the plate member includes a flat surface which is opposite and substantially in parallel to a surface of the substrate.

81. The exposure method according to claim 80, wherein the recovery port is arranged outside the flat surface with respect to the optical path for the exposure light beam.

82. The exposure method according to claim 79, wherein:

the plate member has an opening through which the exposure light beam passes; and

the liquid, which is supplied to the space between one surface of the plate member and the end surface of the optical member, is capable of flowing into the space between the substrate and the other surface of the plate member.