Method for processing pattern data and method for manufacturing electronic device
First Claim
Patent Images
1. A pattern data processing method for processing design data of a mask pattern, the method comprising:
- specifying a predetermined region as a pattern region based on the design data, with the predetermined region having a dimension that is larger than or equal to a first reference value in a first direction and a dimension that is larger than or equal to a second reference value in a direction intersecting the first direction.
1 Assignment
0 Petitions
Accused Products
Abstract
A method for processing data for a mask pattern. The method includes analyzing data of the mask pattern and specifying a pattern region having a predetermined shape and a predetermined dimension from the mask pattern. The pattern region functions as an alignment mark.
-
Citations
17 Claims
-
1. A pattern data processing method for processing design data of a mask pattern, the method comprising:
specifying a predetermined region as a pattern region based on the design data, with the predetermined region having a dimension that is larger than or equal to a first reference value in a first direction and a dimension that is larger than or equal to a second reference value in a direction intersecting the first direction. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17)
Specification