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Method for processing pattern data and method for manufacturing electronic device

  • US 20080270970A1
  • Filed: 03/27/2008
  • Published: 10/30/2008
  • Est. Priority Date: 04/27/2007
  • Status: Abandoned Application
First Claim
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1. A pattern data processing method for processing design data of a mask pattern, the method comprising:

  • specifying a predetermined region as a pattern region based on the design data, with the predetermined region having a dimension that is larger than or equal to a first reference value in a first direction and a dimension that is larger than or equal to a second reference value in a direction intersecting the first direction.

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