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METHOD OF CLEANINIG STANNANE DISTRIBUTION SYSTEM

  • US 20080271753A1
  • Filed: 05/05/2008
  • Published: 11/06/2008
  • Est. Priority Date: 05/03/2007
  • Status: Abandoned Application
First Claim
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1. A method of cleaning a stannane distribution system, comprising:

  • a) providing a stannane distribution system which connects at least one stannane supply source to at least one semiconductor manufacturing tool;

    b) flowing stannane through the stannane distribution system;

    c) forming a layer of tin on at least part of the stannane distribution system by decomposing part of the stannane; and

    d) cleaning the distribution system of at least part of the tin, wherein the cleaning is a dry cleaning performed in the absence of liquid cleaning chemicals.

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