METHOD OF CLEANINIG STANNANE DISTRIBUTION SYSTEM

• US 20080271753A1
• Filed: 05/05/2008
• Published: 11/06/2008
• Est. Priority Date: 05/03/2007
• Status: Abandoned Application

• Current Assignee: L'Air Liquide Societe Anonyme Pour L'Etude et L'Exploitation Des Procedes Georges Claude (L'Air Liquide SA)
• Original Assignee: L'Air Liquide Societe Anonyme Pour L'Etude et L'Exploitation Des Procedes Georges Claude (L'Air Liquide SA)
• Inventors: Hsiao, Cheng-Fang, TARUTANI, Kohei, Sato, Hideyuki
• Application Number:
  US12/115,295
• Publication Number:
  US 20080271753A1
• Time in Patent Office: Days
• US Class Current: 134/4
• CPC Class Codes: B08B 5/00 Cleaning by methods involving the use of air flow or gas flow B08B6/00 takes precedence
• CPC Class Codes: B08B 9/02 Cleaning pipes or tubes or systems of pipes or tubes apparatus for cleaning metal pipes by chemical methods C23G3/04 ; removing obstructions in waste pipes or sinks E03C1/30; cleaning sewer pipes E03F9/00; cleaning boreholes or wells E21B37/00; cleaning furnace tubes, flues, chimneys F23J3/02; cleaning heat-transfer conduits, e.g. water tubes of boilers F28G

Abstract

Methods for cleaning a stannane distributions system. A stannane distribution system connecting a stannane supply source and a semiconductor manufacturing tool is provided. Stannane is flown through the system, and a tin layer is formed on the components of the distribution system. This tin layer is then cleaned from the distribution system without the use of liquid cleaning chemicals.

Claims

1. A method of cleaning a stannane distribution system, comprising:

a) providing a stannane distribution system which connects at least one stannane supply source to at least one semiconductor manufacturing tool;

b) flowing stannane through the stannane distribution system;

c) forming a layer of tin on at least part of the stannane distribution system by decomposing part of the stannane; and

d) cleaning the distribution system of at least part of the tin, wherein the cleaning is a dry cleaning performed in the absence of liquid cleaning chemicals.

2. The method of claim 1, further comprising:

a) providing a cleaning gas mixture supply source connected to the distribution system, wherein the cleaning gas mixture supply source contains a cleaning gas mixture which comprises a halogen; and

b) introducing the cleaning gas mixture from the cleaning gas mixture supply source to the distribution system.

3. The method of claim 1, wherein the cleaning gas mixture comprises chlorine.

4. The method of claim 3, wherein the cleaning gas mixture further comprises at least one additive selected from the group consisting of:

HCl, HBr, and H₂.

5. The method of claim 4, wherein the cleaning gas mixture comprises between about 0.1% and about 20%, by volume, of the additive.

6. The method of claim 2, further comprising introducing the cleaning gas mixture at a pressure of less than about 60 torr.

7. The method of claim 6, further comprising introducing the cleaning gas mixture at a pressure greater than about 30 torr.

8. The method of claim 2, further comprising maintaining the pressure of the cleaning gas mixture within the distribution system within a tolerance of 10% of the pressure at which the cleaning gas mixture is introduced.

9. The method of claim 2, further comprising introducing the cleaning gas while exposing the distribution system to a vacuum.

10. The method of claim 1, further comprising purging the distribution system with an inert gas prior to the cleaning step.

11. The method of claim 10, further comprising exposing the distribution system to a vacuum after the introduction of the inert gas.

12. The method of claim 1, further comprising purging the distribution system with an inert gas after the cleaning step.

13. The method of claim 12, further comprising exposing the distribution system to a vacuum after the introduction of the inert gas.

14. The method of claim 2, further comprising

a) taking at least one measurement at a point upstream on the distribution system;

b) taking at least one measurement at a point downstream on the distribution system; and

c) comparing the two measurements to determine if the distribution system has been sufficiently cleaned of deposited tin.

15. The method of claim 14, wherein the upstream measurement and the downstream measurement are both pressure measurements.

16. The method of claim 14, wherein the upstream measurement and the downstream measurement are mass flow measurements.

17. The method of claim 2, further comprising cleaning the distribution system for a set period of time.

18. The method of claim 2, further comprising cleaning at least about 50% of the deposited tin from the distribution system.

19. The method of claim 18, further comprising cleaning at least about 99% of the deposited tin from the distribution system.

20. The method of claim 2, further comprising removing substantially all of the cleaning gas from the distribution system and reintroducing stannane into the distribution system.