Micromachined membrane filter device for a glaucoma implant and method for making the same

• US 20080277332A1
• Filed: 05/11/2007
• Published: 11/13/2008
• Est. Priority Date: 05/11/2007
• Status: Abandoned Application

• Current Assignee: Becton, Dickinson & Co
• Original Assignee: Becton, Dickinson & Co
• Inventors: Liu, Zhixiong (Eric)
• Application Number:
  US11/798,238
• Publication Number:
  US 20080277332A1
• Time in Patent Office: Days
• US Class Current: 210/500.22
• CPC Class Codes: A61F 9/00781 Apparatus for modifying intraocular pressure, e.g. for glaucoma treatment drainage implants in general A61M27/002
• CPC Class Codes: B01D 2325/028 Microfluidic pore structures
• CPC Class Codes: B01D 2325/48 Antimicrobial properties
• CPC Class Codes: B01D 67/0062 by micromachining techniques, e.g. using masking and etching steps, photolithography
• CPC Class Codes: B01D 71/0213 Silicon
• CPC Class Codes: B01D 71/0215 Silicon carbide; Silicon nitride; Silicon oxycarbide

Abstract

A MEMS-fabricated filter device for an ophthalmic shunt and a method for making the same. The filter device may include: a membrane with a plurality of pores, substantially uniformly sized to achieve a therapeutic flow rate while substantially preventing bacterial passage therethrough; a pair of substrates, each bonded to an opposing side of the membrane, and each having an axial inlet opening at a distal end thereof, and a cross-shaped support disposed in one of the substrates, the cross-shaped support supporting the membrane. The filter device may also include: a substrate having a passage therethrough; a membrane, axially recessed from opposing ends of the substrate and having a plurality of pores, substantially uniformly sized to achieve a therapeutic flow rate while substantially preventing bacterial passage therethrough; and a conformal coating covering the membrane. The method may include depositing a membrane layer on a substrate, patterning pores in the membrane layer to define an initial size of the pores, backside etching the substrate to the membrane layer, and conformally coating the membrane layer.

Claims

1. A MEMS-fabricated filter device for an ophthalmic shunt, comprising:

a substrate having a passage therethrough;

a membrane, said membrane being axially recessed from opposing ends of the substrate and having a plurality of pores, substantially uniformly sized to achieve a therapeutic flow rate while substantially preventing bacterial passage therethrough; and

a conformal coating covering the membrane.

2. The filter device according to claim 1, wherein the substrate comprises silicon.

3. The filter device according to claim 1, wherein the substrate comprises one of quartz and glass.

4. The filter device according to claim 1, wherein the conformal coating is deposited.

5. The filter device according to claim 1, wherein the filter device is substantially cylindrical.

6. The filter device according to claim 1, wherein the membrane has a plurality of surface micro-channels connecting adjacent pores.

7. The filter device according to claim 1, wherein the pores are one of substantially oval-shaped, substantially circular, substantially rectangular, and substantially hexagonal.

8. The filter device according to claim 1, wherein the pores are substantially racetrack-shaped.

9. The filter device according to claim 1, wherein the substrate has a recess disposed at a first end thereof, in which the membrane is disposed.

10. The filter device according to claim 9, wherein the conformal coating covers the substrate.

11. The filter device according to claim 1, wherein:

the substrate comprises a first substrate portion bonded with a second substrate portion;

the membrane is disposed therebetween;

the conformal coating covers the first substrate portion; and

the first and second substrates have respective axial inlet openings at distal ends thereof.

12. The filter device according to claim 11, wherein the second substrate has a cavity defined therein to accommodate the membrane, and a plurality of axial inlet openings at the distal end thereof.

13. The filter device according to claim 11, wherein the conformal coating covers the second substrate portion.

14. The filter device according to claim 13, wherein the first substrate portion comprises a cross-shaped support disposed therein supporting the membrane.

15. The filter device according to claim 14, wherein the second substrate portion comprises a cross-shaped support disposed therein supporting the membrane.

16. The filter device according to claim 13, further comprising a second coating deposited on the conformal coating.

17. The filter device according to claim 16, wherein the second coating comprises one of silicon dioxide, titanium, gold, platinum, titanium nitride, Phosphorylcholine (PC), Polyethylene glycol (PEG), and a silver containing antimicrobial coating.

18. The filter device according to claim 16, wherein the second coating comprises titanium.

19. The filter device according to claim 1, wherein the membrane comprises one of single crystal silicon and silicon nitride;

and

the conformal coating comprises one of silicon nitride, silicon dioxide, Parylene, a silver film, an antimicrobial material, and titanium.

20. The filter device according to claim 1, wherein:

the membrane comprises single crystal silicon; and

the conformal coating comprises silicon nitride.

21. A MEMS-fabricated filter device for an ophthalmic shunt, comprising:

a membrane having a plurality of pores, sized to achieve a therapeutic flow rate while substantially preventing bacterial passage therethrough;

a pair of substrates disposed on opposing sides of the membrane, each having a cross-shaped support supporting the membrane and an axial inlet opening at a distal end thereof; and

a conformal coating covering the membrane and the substrates.

22. The filter device according to claim 21, wherein the substrates comprise silicon.

23. The filter device according to claim 21, wherein the substrates comprise at least one of quartz and glass.

24. The filter device according to claim 21, wherein the conformal coating is deposited.

25. The filter device according to claim 21, further comprising a second coating disposed on the conformal coating.

26. The filter device according to claim 25, wherein the second coating is deposited on the conformal coating.

27. The filter device according to claim 25, wherein:

the membrane comprises a single crystal silicon;

the conformal coating comprises silicon nitride; and

the second coating comprises titanium.

28. The filter device according to claim 21, wherein the filter device is substantially cylindrical.

29. The filter device according to claim 21, wherein the membrane has a plurality of surface micro-channels connecting adjacent pores.

30. The filter device according to claim 21, wherein the pores are substantially racetrack-shaped.

31. A MEMS-fabricated filter device for an ophthalmic shunt, comprising:

a substrate of unitary construction having a passage therethrough; and

a membrane, said membrane having an outer circumferential portion disposed at a first end of the substrate and a central portion axially recessed from opposing ends of the substrate, and having a plurality of pores, substantially uniformly sized to achieve a therapeutic flow rate while substantially preventing bacterial passage therethrough.

32. The filter device according to claim 31, further comprising a conformal coating covering the filter device.

33. The filter device according to claim 31, wherein the membrane has a plurality of surface micro-channels connecting adjacent pores.

34. The filter device according to claim 31, wherein the pores are substantially racetrack-shaped.

35. A method of manufacturing a MEMS-fabricated filter device for an ophthalmic shunt, comprising:

etching a recess on a first end of a substrate to support a membrane;

conformally depositing a core membrane on the first end of the substrate, covering the recess;

etching an initial size of pores in the membrane;

etching a central portion of the substrate from a second end, opposite the first end, until the membrane is reached; and

conformally coating the membrane and substrate, whereby a size of the pores is finalized and the membrane is strengthened.

36. A MEMS-fabricated filter device for an ophthalmic shunt, comprising:

a first substrate having a passage therethrough;

a membrane having a plurality of pores, substantially uniformly sized to achieve a therapeutic flow rate while substantially preventing bacterial passage therethrough, the membrane being disposed at a first end of the first substrate; and

a second substrate having a recess to accommodate the membrane, the second substrate having a plurality of axial passages acting as a pre-filter to the membrane, the second substrate being bonded at an outer peripheral portion thereof to an outer peripheral portion of the first substrate such that the axial passages of the second substrate substantially align with the passage of the first substrate.

37. The filter device according to claim 36, further comprising a conformal coating covering the membrane and the first substrate.

38. The filter device according to claim 36, wherein the membrane has a plurality of surface micro-channels connecting adjacent pores.

39. The filter device according to claim 36, wherein the pores are substantially racetrack-shaped.

40. A method of manufacturing a MEMS-fabricated filter device for an ophthalmic shunt, comprising:

depositing a membrane layer on a first substrate;

removing a portion of the membrane layer by patterning to define a bonding area on the first substrate;

patterning pores in the membrane layer to define an initial size of the pores;

backside etching the substrate to the membrane layer;

conformally coating the membrane layer and the first substrate to finalize the pore size;

etching a cavity in a second substrate to accommodate the membrane;

etching inlet ports in the second substrate to function as a pre-filter for the membrane; and

fusion boding the second substrate on the bonding area of the first substrate.

41. A MEMS-fabricated filter device for an ophthalmic shunt, comprising:

a membrane having a plurality of pores, substantially uniformly sized to achieve a therapeutic flow rate while substantially preventing bacterial passage therethrough;

a pair of substrates, each bonded to an opposing side of the membrane, and each having an axial inlet opening at a distal end thereof; and

a cross-shaped support disposed in one of the substrates, the cross-shaped support supporting the membrane.

42. The filter device according to claim 41, wherein the cross-shaped support is integrally formed as a unitary construction with the substrate.

43. The filter device according to claim 41, further comprising a second cross-shaped support disposed in the remaining one of the substrates, each of the cross-shaped supports supporting the membrane.

44. The filter device according to claim 43, wherein the cross-shaped supports are integrally formed as respective unitary constructions with the substrates.

45. The filter device according to claim 41, further comprising a conformal coating covering the membrane and the substrates.

46. The filter device according to claim 41, wherein the membrane has a plurality of surface micro-channels connecting adjacent pores.

47. The filter device according to claim 41, wherein the pores are substantially racetrack-shaped.

48. A method of manufacturing a MEMS-fabricated filter device for an ophthalmic shunt, comprising:

depositing a membrane layer on a substrate;

patterning pores in the membrane layer to define an initial size of the pores;

backside etching the substrate to the membrane layer; and

conformally coating the membrane layer.

49. The method according to claim 48, wherein the conformally coating the membrane layer comprises at least one coating, where each coating shrinks a size of the pores.

50. A method of manufacturing a MEMS-fabricated filter device for an ophthalmic shunt, comprising:

defining pores in a silicon membrane layer of a silicon on insulator (SOI) wafer using a first photo mask;

oxidizing a top and bottom of a silicon wafer to define a mask side and an etch stop side of the silicon wafer;

creating alignment marks on the silicon wafer using a second photo mask;

fusion bonding the etch stop side of the silicon wafer to the silicon membrane of the SOI wafer;

annealing the wafers and oxidizing exposed ends of the wafers;

etching the oxide on the silicon wafer and deep reactive ion etching the silicon of the silicon wafer to the etch stop oxide of the silicon wafer using the second photo mask;

etching the oxide on the SOI wafer and deep reactive ion etching the silicon of the SOI wafer to the insulator of the SOI wafer using a third photo mask;

removing the oxide on opposing sides of the silicon membrane layer using a timing etch; and

cover coating the silicon membrane layer, SOI wafer, and the silicon wafer.

51. The method according to claim 50, wherein the cover coating the silicon membrane layer, SOI wafer, and the silicon wafer comprises depositing a conformal coating on the silicon membrane layer, SOI wafer, and the silicon wafer.

52. The method according to claim 51, wherein the cover coating the silicon membrane layer, SOI wafer, and the silicon wafer further comprises depositing a second coating on the conformal coating.

53. The method according to claim 52, wherein:

the conformal coating comprises silicon nitride; and

the second coating comprises titanium.

54. The method according to claim 50, wherein the etching the oxide on the silicon wafer and deep reactive ion etching the silicon of the silicon wafer to the etch stop oxidation of the silicon wafer comprises forming a cross-shaped support in the silicon wafer to support the silicon membrane layer.

55. The method according to claim 50, wherein the etching the oxide on the SOI wafer and deep reactive ion etching the silicon of the SOI wafer to the insulator of the SOI wafer comprises forming a cross-shaped support in the SOI wafer to support the silicon membrane layer.

56. The method according to claim 50, wherein:

the etching the oxide on the silicon wafer and deep reactive ion etching the silicon of the silicon wafer to the etch stop oxidation of the silicon wafer comprises forming a cross-shaped support in the silicon wafer to support the silicon membrane layer; and

the etching the oxide on the SOI wafer and deep reactive ion etching the silicon of the SOI wafer to the insulator of the SOI wafer comprises forming a cross-shaped support in the SOI wafer to support the silicon membrane layer.