MICROMECHANICAL DEVICE, MICROMECHANICAL SYSTEM, APPARATUS FOR ADJUSTING SENSITIVITY OF A MICROMECHANICAL DEVICE, METHOD FOR PRODUCING A MICROMECHANICAL DEVICE
First Claim
1. A micromechanical device comprisinga layer;
- at least a first slot formed in the layer to define a first oscillation element oscillatably suspended via a first spring portion of the layer; and
at least a second slot formed in the layer to define a second oscillation element oscillatably suspended via a second spring portion of the layer, wherein a trench is formed in the spring portion pair in a main surface of the layer,wherein a resonance frequency of the first oscillation element is different from a resonance frequency of the second oscillation element, and the first spring portion, the second spring portion and the trench are formed such that, in an anisotropic lateral material removal and/or an anisotropic lateral material addition of the first spring portion and the second spring portion, a ratio of a relative change of the resonance frequency of the second oscillation element to a relative change of the resonance frequency of the first oscillation element ranges from 0.8 to 1.2.
1 Assignment
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Accused Products
Abstract
A micromechanical device has a layer; at least a first slot formed in the layer to define a first oscillation element oscillatably suspended via a first spring portion of the layer; and at least a second slot formed in the layer to define a second oscillation element oscillatably suspended via a second spring portion of the layer, wherein a trench is formed in the spring portion pair in a main surface of the layer, wherein a resonance frequency of the first oscillation element is different from that of the second oscillation element, and the first and second spring portions and the trench are formed such that, in an anisotropic lateral material removal and/or addition of the first and second spring portions, a ratio of a relative change of the resonance frequency of the second oscillation element to that of the first oscillation element ranges from 0.8 to 1.2.
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Citations
26 Claims
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1. A micromechanical device comprising
a layer; -
at least a first slot formed in the layer to define a first oscillation element oscillatably suspended via a first spring portion of the layer; and at least a second slot formed in the layer to define a second oscillation element oscillatably suspended via a second spring portion of the layer, wherein a trench is formed in the spring portion pair in a main surface of the layer, wherein a resonance frequency of the first oscillation element is different from a resonance frequency of the second oscillation element, and the first spring portion, the second spring portion and the trench are formed such that, in an anisotropic lateral material removal and/or an anisotropic lateral material addition of the first spring portion and the second spring portion, a ratio of a relative change of the resonance frequency of the second oscillation element to a relative change of the resonance frequency of the first oscillation element ranges from 0.8 to 1.2. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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- 12. A micromechanical device comprising a layer, in which at least two outer slots are formed to define a first oscillation system with an oscillating frame oscillatably suspended via a first outer spring portion and a second outer spring portion of the layer, and wherein at least two inner slots are formed in the layer within the oscillating frame, in order to define a second oscillation system with an oscillation element oscillatably suspended via two inner spring portions of the layer, wherein a resonance frequency of the first oscillation system is different from a resonance frequency of the second oscillation system, wherein a trench each is formed in a main surface of the layer in a pair of the spring portions, and wherein the inner spring portions, the outer spring portions and the trenches are formed such that, in an anisotropic lateral material removal and/or an anisotropic lateral material addition of the inner spring portions and the outer spring portions, a ratio of a relative change of the resonance frequency of the second oscillation system to a relative change of the resonance frequency of the first oscillation system ranges from 0.8 to 1.2.
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15. A micromechanical system, comprising
a first micromechanical device comprising a layer in which at least one slot is formed to define an oscillation element oscillatably suspended via a spring portion of the layer; - and
a second micromechanical device comprising a layer in which at least a second slot is formed to define a second oscillation element oscillatably suspended via a second spring portion of the layer, wherein a trench is formed in a main surface of the layer in the second spring portion; wherein a resonance frequency of the first oscillation element is different from a resonance frequency of the second oscillation element, and the first spring portion, the second spring portion and the trench are formed such that, in an anisotropic lateral material removal and/or an anisotropic lateral material addition of the first spring portion and the second spring portion, a ratio of a relative change of the resonance frequency of the second oscillation element to a relative change of the resonance frequency of the first oscillation element ranges from 0.8 to 1.2. - View Dependent Claims (16, 17)
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18. An apparatus for designing a micromechanical device with adapted sensitivity, comprising:
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a receiver for receiving design data of the micromechanical device; a definer for defining a sensitivity of a spring portion of the micromechanical device with respect to fabrication variations; and a determinator for determining a structure and arrangement of a trench, which is formed in the production of the micromechanical device of a layer in the spring portion of the micromechanical device in a main surface of the layer, in order to achieve the defined sensitivity of the spring portion. - View Dependent Claims (19, 20)
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21. A method for producing a micromechanical device comprising:
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providing a layer; producing at least a first slot in the layer to define an oscillation element oscillatably suspended via a spring portion of the layer; and producing at least a second slot in the layer to define an oscillation element oscillatably suspended via a spring portion of the layer; and forming a trench in the second spring portion in a main surface of the layer, wherein a resonance frequency of the first oscillation element is different from a resonance frequency of the second oscillation element, and the first spring portion, the second spring portion and the trench are formed such that, in an anisotropic lateral material removal and/or an anisotropic lateral material addition of the first spring portion and the second spring portion, a ratio of a relative change of the resonance frequency of the second oscillation element to a relative change of the resonance frequency of the first oscillation element ranges from 0.8 to 1.2. - View Dependent Claims (22, 23, 24)
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25. A micromechanical device comprising
a layer in which at least one slot is formed to define an oscillation element oscillatably suspended via a spring portion of the layer, wherein a trench in form of a depression is formed in the spring portion in a main surface of the layer.
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26. A micromechanical device comprising
a layer in which at least one slot is formed to define an oscillation element oscillatably suspended via spring portion of the layer, wherein a trench is formed in the spring portion in a main surface of the layer, wherein the trench is shorter than a length of the spring portion.
Specification