Scheduling System and Method
First Claim
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1. An apparatus for scheduling in a wafer fab, comprising:
- (a) means for weighting inventories according to at least one of logpoints or reticle, and photolithography units;
(b) means for scheduling one of said inventories on one of said photolightography units, wherein said one of said inventories has a maximal weighting; and
(c) means for eliminating any of said inventories not scheduled according to constraints.
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Abstract
A method and apparatus for scheduling in a wafer fab. The method comprising means for weighting inventories according to at least one of logpoints or reticle, and photolithography units, means for scheduling one of said inventories on one of said photolightography units, wherein said one of said inventories has a maximal weighting and means for eliminating any of said inventories not scheduled according to constraints.
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Citations
8 Claims
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1. An apparatus for scheduling in a wafer fab, comprising:
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(a) means for weighting inventories according to at least one of logpoints or reticle, and photolithography units; (b) means for scheduling one of said inventories on one of said photolightography units, wherein said one of said inventories has a maximal weighting; and (c) means for eliminating any of said inventories not scheduled according to constraints. - View Dependent Claims (2, 3, 4)
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5. A system for scheduling in a wafer fab, comprising:
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(a) means for weighting inventories according to at least one of logpoints or reticles, and photolithography units; (b) means for scheduling one of said inventories on one of said photolightography units wherein said one of said inventories has a maximal weighting; and (c) means for eliminating any of said inventories not scheduled according to constraints. - View Dependent Claims (6, 7, 8)
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Specification