Antireflection Film, Production Method Thereof, Polarizing Plate Using the Antireflection Film and Image Display Device Using the Antireflection Film or Polarizing Plate
First Claim
1. An antireflection film comprising:
- a support; and
at least one low refractive index layer including a first low refractive index layer, the first low refractive index layer being located most distant from the support,wherein the first low refractive index layer comprises;
a resin curable upon irradiation with ionizing radiation; and
a compound having a polysiloxane partial structure, andwherein the ratio Si(a)/Si(b) of a photoelectron spectral intensity {Si(a)} of silicon atom on the outermost surface of the first low refractive index layer to a photoelectron spectral intensity {Si(b)} of silicon atom in a deeper position at a depth corresponding to 80% of a thickness of the first low refractive index layer from the outermost surface is 5.0 or more.
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Accused Products
Abstract
An antireflection film comprises: a support; and at least one low refractive index layer including a first low refractive index layer, the first low refractive index layer being located most distant from the support, wherein the first low refractive index layer comprises: a resin curable upon irradiation with ionizing radiation; and a compound having a polysiloxane partial structure, and wherein the ratio Si(a)/Si(b) of a photoelectron spectral intensity {Si(a)} of silicon atom on the outermost surface of the first low refractive index layer to a photoelectron spectral intensity {Si(b)} of silicon atom in a deeper position at a depth corresponding to 80% of a thickness of the first low refractive index layer from the outermost surface is 5.0 or more.
15 Citations
15 Claims
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1. An antireflection film comprising:
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a support; and at least one low refractive index layer including a first low refractive index layer, the first low refractive index layer being located most distant from the support, wherein the first low refractive index layer comprises;
a resin curable upon irradiation with ionizing radiation; and
a compound having a polysiloxane partial structure, andwherein the ratio Si(a)/Si(b) of a photoelectron spectral intensity {Si(a)} of silicon atom on the outermost surface of the first low refractive index layer to a photoelectron spectral intensity {Si(b)} of silicon atom in a deeper position at a depth corresponding to 80% of a thickness of the first low refractive index layer from the outermost surface is 5.0 or more. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 10, 11, 14)
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9. A method for producing an antireflection film comprising a support and at least one low refractive index layer including a first low refractive index layer, the first low refractive index layer being located most distant from the support,
wherein the method comprises: -
coating a coating composition for the first low refractive index layer comprising a resin curable upon irradiation with ionizing radiation and a compound having a polysiloxane partial structure or a fluoroalkyl group on a support directly or via at least one layer; and curing the composition by combining irradiation of ionizing radiation and a heat treatment before, simultaneous with or after the irradiation so that the ratio Si(a)/Si(b) of a photoelectron spectral intensity {Si(a)} of silicon atom on the outermost surface of the first low refractive index layer of the antireflection film to a photoelectron spectral intensity {Si(b)} of silicon atom in a deeper portion at a depth corresponding to 80% of a thickness of the first low refractive index layer from the outermost surface can be 5.0 or more. - View Dependent Claims (12, 13, 15)
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Specification