Organic light emitting display apparatus and method of fabricating the same

• US 20080290790A1
• Filed: 09/10/2007
• Published: 11/27/2008
• Est. Priority Date: 05/22/2007
• Status: Abandoned Application

• Current Assignee: Samsung Mobile Display Company Limited (Samsung Group)
• Original Assignee: Samsung Mobile Display Company Limited (Samsung Group)
• Inventors: Jin, Dong-Un
• Application Number:
  US11/898,244
• Publication Number:
  US 20080290790A1
• Time in Patent Office: Days
• US Class Current: 313/504
• CPC Class Codes: H10K 59/122 Pixel-defining structures or layers, e.g. banks

Abstract

An organic light emitting display device and method of making thereof where a black matrix element is not separately formed and where the occurrence of defects caused by separately forming the black matrix element is prevented. The organic light emitting display includes a pixel electrode; and a pixel defining layer having an opening which either entirely exposes the pixel electrode or exposes only a central portion of the pixel electrode, wherein the pixel defining layer has a multi-layered structure at a end surface of the opening of the pixel defining layer.

Claims

1. An organic light emitting display, comprising:

a pixel electrode; and

a pixel defining layer having an opening which exposes at least a central portion of the pixel electrode, wherein the pixel defining layer has a multi-layered structure at an end surface of the opening of the pixel defining layer.

2. The organic light emitting display of claim 1, wherein the multi-layered structure comprises a black matrix material layer and a layer absent black matrix material, a bottom layer of the multi-layered structure being the layer absent black matrix material.

3. The organic light emitting display of claim 1, wherein the bottom layer of the multi-layered structure comprises an element selected from a group consisting of silicon oxide, silicon nitride, aluminum oxide, indium oxide, thoron oxide and polyimide.

4. The organic light emitting display of claim 1, wherein the opening of the pixel defining layer exposes only the central portion of the pixel electrode, a bottom layer of the multi-layered structure being a closed structure away from edges of a substrate and having an opening therein, and external ends of the bottom layer of the multi-layered structure correspond to external ends of the pixel electrode.

5. The organic light emitting display of claim 1, wherein the opening of the pixel defining layer exposes only the central portion of the pixel electrode, and a bottom layer of the multi-layered structure covers external ends of the pixel electrode.

6. The organic light emitting display of claim 1, wherein ends of the opening of the pixel defining layer exposes an entirety of the pixel electrode, and wherein in the end surface of the pixel defining layer, the thickness of the bottom layer of the multi-layered structure is greater than the thickness of the pixel electrode.

7. A method of fabricating an organic light emitting display, comprising:

forming a conductive layer on a substrate;

forming a first insulating layer on the conductive layer;

forming a pixel electrode and a sacrificial layer which covers the pixel electrode and has ends corresponding to ends of the pixel electrode respectively by patterning the conductive layer and the first insulating layer into an closed pattern away from edges of the substrate;

forming a second insulating layer covering the pixel electrode and the sacrificial layer;

exposing only a central portion of the sacrificial layer by forming an opening in the second insulating layer; and

exposing a central portion of the pixel electrode by removing the portion of the sacrificial layer exposed by the opening of the second insulating layer.

8. The method of claim 7, wherein the second insulating layer is comprised of a black matrix forming material.

9. The method of claim 7, wherein the first insulating layer is comprised of an element selected from the group consisting of silicon oxide, silicon nitride, aluminum oxide, indium oxide, thoron oxide and polyimide.

10. A method of fabricating an organic light emitting display, comprising:

forming a pixel electrode on a substrate;

forming a first insulating layer covering the pixel electrode;

forming a second insulating layer covering the first insulating layer;

exposing a portion of the first insulating layer corresponding to the pixel electrode by forming an opening in the second insulating layer; and

exposing the pixel electrode by removing the portion of the first insulating layer exposed by the opening of the second insulating layer.

11. The method of claim 10, wherein the opening formed in the second insulating layer exposes only a portion of the first insulating layer corresponding to only a central portion of the pixel electrode, and

in the exposing the pixel electrode, only the central portion of the pixel electrode is exposed.

12. The method of claim 10, wherein the second insulating layer is comprised of a black matrix forming material.

13. The method of claim 10, wherein the first insulating layer is comprised of an element selected from a group consisting of silicon oxide, silicon nitride, aluminum oxide, indium oxide, thoron oxide and polyimide.

14. A method of fabricating an organic light emitting display, comprising:

forming a conductive layer on a substrate;

forming a first insulating layer on the conductive layer;

forming a pixel electrode and a sacrificial layer which covers the pixel electrode and has ends corresponding to ends of the pixel electrode respectively by pattering the conductive layer and the first insulating layer into a closed pattern away from edges of the substrate;

forming a second insulating layer covering the pixel electrode and the sacrificial layer;

exposing the sacrificial layer by forming an opening in the second insulating layer; and

exposing the pixel electrode by removing the sacrificial layer.

15. The method of claim 14, wherein the second insulating layer is comprised of a black matrix forming material.

16. The method of claim 14, wherein the first insulating layer is comprised of an element selected from a group consisting of silicon oxide, silicon nitride, aluminum oxide, indium oxide, thoron oxide and polyimide.