×

FULL SPECTRUM ADAPTIVE FILTERING (FSAF) FOR LOW OPEN AREA ENDPOINT DETECTION

  • US 20080291428A1
  • Filed: 05/24/2007
  • Published: 11/27/2008
  • Est. Priority Date: 05/24/2007
  • Status: Active Grant
First Claim
Patent Images

1. A method of detecting a desired etch state while etching a substrate, the method comprising:

  • (a) providing first and second reference spectrums;

    (b) detecting optical emissions during etching of the substrate to generate a runtime optical emission spectrum (OES);

    (c) comparing the runtime OES with the first and second reference spectrums using adaptive filtering to generate a comparator output; and

    (d) repeating (b) and (c) until the desired etch state is detected based on the comparator output.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×