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EXHAUST ASSEMBLY FOR A PLASMA PROCESSING SYSTEM

  • US 20080295964A1
  • Filed: 08/22/2008
  • Published: 12/04/2008
  • Est. Priority Date: 08/11/2006
  • Status: Active Grant
First Claim
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1. A plasma processing system configured to process a substrate with plasma, comprising:

  • a plasma processing chamber configured to facilitate the formation of a processing plasma;

    a substrate holder coupled to said plasma processing chamber and configured to support said substrate;

    a plasma generation system coupled to said plasma processing chamber and configured to form said processing plasma from a process gas in a process space adjacent said substrate;

    a vacuum pumping system coupled to said plasma processing chamber and configured to evacuate said process gas;

    an exhaust assembly coupled to said plasma processing chamber around said substrate holder and separating said process space from a pumping space coupled to said vacuum pumping system; and

    an electrical power source coupled to said exhaust assembly and configured to form a secondary plasma in order to alter said processing plasma.

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