APPARATUS AND METHODS FOR IMPROVING TREATMENT UNIFORMITY IN A PLASMA PROCESS
First Claim
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1. An apparatus for use in plasma processing a workpiece having an outer peripheral edge, the apparatus comprising:
- a sacrificial body composed of a plasma-removable material, said sacrificial body adapted to be arranged about the outer peripheral edge of the workpiece so that an outer diameter of the workpiece is effectively increased.
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Abstract
Apparatus and methods for improving treatment uniformity in a plasma process. The sacrificial body, which is extends about an outer peripheral edge of the workpiece during plasma processing, is composed of a plasma-removable material. The sacrificial body may include multiple sections that are arranged to define a circular geometrical shape. The sacrificial body functions to increase the effective outer diameter of the workpiece, which operates to alleviate detrimental edge effects intrinsic to plasma processing by effectively reducing the etch rate near the outer peripheral edge of the workpiece.
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Citations
19 Claims
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1. An apparatus for use in plasma processing a workpiece having an outer peripheral edge, the apparatus comprising:
a sacrificial body composed of a plasma-removable material, said sacrificial body adapted to be arranged about the outer peripheral edge of the workpiece so that an outer diameter of the workpiece is effectively increased. - View Dependent Claims (2, 3, 4, 5, 6)
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7. An apparatus for plasma processing a workpiece having an outer peripheral edge, a first surface, and a second surface connected by the outer peripheral edge, the apparatus comprising:
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a vacuum enclosure configured to contain a plasma, said vacuum enclosure including a support pedestal adapted to contact and support the second surface of the workpiece when the first surface of the workpiece is exposed to the plasma; and a sacrificial body composed of a plasma-removable material, said sacrificial body extending about the outer peripheral edge of the workpiece supported on said pedestal so that an outer diameter of the workpiece is effectively increased. - View Dependent Claims (8, 9, 10, 11, 12, 13, 14)
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15. A method for plasma etching a workpiece having a first surface, a second surface, and an outer peripheral edge connecting the first and second surfaces, the method comprising:
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arranging a sacrificial body composed of a plasma-removable material about the outer peripheral edge of the workpiece; exposing the first surface of the workpiece and the sacrificial body to a plasma; and shifting a maximum etch rate from a location on the first surface of the workpiece to a different location on the sacrificial body. - View Dependent Claims (16, 17, 18, 19)
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Specification