Exposure method, exposure apparatus, and method for producing device
First Claim
1. An exposure method for exposing a substrate via a pattern with an exposure light by illuminating the pattern with the exposure light, the exposure method comprising:
- performing measurement of alignment information of a first substrate before and after exposure of the first substrate; and
correcting alignment information of a second substrate before exposure of the second substrate, based on a result of the measurement.
1 Assignment
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Accused Products
Abstract
An exposure method includes measuring coordinates of alignment marks before and after exposing a first wafer to determine a fluctuation amount of a parameter of the alignment; measuring coordinates of alignment marks before exposing a second wafer to determine a parameter of the alignment; and aligning and exposing the second wafer based on a parameter obtained by correcting the parameter with the fluctuation amount determined for the first wafer. A high overlay accuracy can be obtained even when the alignment information is gradually changed, for example, due to the linear expansion and contraction of the substrate during the exposure of the substrate.
59 Citations
72 Claims
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1. An exposure method for exposing a substrate via a pattern with an exposure light by illuminating the pattern with the exposure light, the exposure method comprising:
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performing measurement of alignment information of a first substrate before and after exposure of the first substrate; and correcting alignment information of a second substrate before exposure of the second substrate, based on a result of the measurement. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 69)
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13. An exposure method for exposing a substrate via a pattern with an exposure light by illuminating the pattern with the exposure light, the exposure method comprising:
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a first step of performing measurement of alignment information of a first substrate before exposure of the first substrate; a second step of exposing the first substrate via the pattern while performing alignment for the first substrate based on a result of the measurement in the first step; a third step of performing measurement of alignment information of the first substrate after the exposure of the first substrate; and a fourth step of determining a fluctuation amount of the alignment information measured in the third step with respect to the alignment information measured in the first step. - View Dependent Claims (14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 70)
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24. An exposure method for exposing a substrate with an exposure light, the exposure method comprising:
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performing exposure of a first substrate with the exposure light, and then performing detection of a mark disposed on the first substrate after the exposure; and performing exposure of a second substrate by using a result of the detection of the mark. - View Dependent Claims (25, 26, 27, 28, 29, 30, 31, 32, 71)
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33. An exposure method for exposing a substrate with an exposure light, the exposure method comprising:
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performing detection of a mark of a first substrate both before and after exposure of the first substrate with the exposure light; and determining alignment information of a second substrate by using a result of the detection after the exposure. - View Dependent Claims (34, 35, 36, 37, 38, 39, 40, 41, 42, 43, 44, 72)
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45. An exposure apparatus which exposes a substrate via a pattern with an exposure light by illuminating the pattern with the exposure light, the exposure apparatus comprising:
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a measuring device which measures alignment information of the substrate; a controller which controls exposure of the substrate while performing alignment for the substrate based on a result of the measurement performed by the measuring device; and a calculating device which determines a fluctuation amount of alignment information measured after exposure of a predetermined substrate by the measuring device with respect to alignment information measured before the exposure of the predetermined substrate by the measuring device. - View Dependent Claims (46, 47, 48, 49, 50, 51, 52, 53, 54, 55, 56, 57)
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58. An exposure apparatus which exposes a substrate with an exposure light, the exposure apparatus comprising:
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a mark-detecting system which performs detection of a mark of the substrate; and a controller which controls exposure of another substrate, that is to be exposed next to the substrate, by using a result of the detection of the mark of the substrate obtained by the mark-detecting system after exposure of the substrate. - View Dependent Claims (59, 60, 61, 62, 63)
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64. An exposure apparatus which exposes a substrate with an exposure light, the exposure apparatus comprising:
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a mark-detecting system which performs detection of a mark of the substrate; and a controller which determines alignment information of another substrate, that is to be exposed next to the substrate, by using a result of the detection of the mark of the substrate obtained each before and after the exposure by the mark-detecting system. - View Dependent Claims (65, 66, 67, 68)
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Specification