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Sputtering Target, Thin Film for Optical Information Recording Medium and Process for Producing the Same

  • US 20080299415A1
  • Filed: 07/24/2008
  • Published: 12/04/2008
  • Est. Priority Date: 03/04/2003
  • Status: Active Grant
First Claim
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1. A method of manufacturing a thin film for an optical information recording medium comprising the step of forming a thin film via direct current sputtering of a sputtering target that has a relative density of 90% or more and that contains a compound having as its principal component zinc oxide satisfying AXBYO(KaX+KbY)/2(ZnO)m, where 1<

  • m, X≦

    m, 0<

    Y≦

    0.9, and X+Y=2, and where A and B are respectively different positive elements of trivalence or more, and the valencies thereof are respectively Ka and Kb, and wherein a range of variation of positive elements other than zinc in the target is within 0.5% and a range of variation of density in the target is within 3%.

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