METHODS AND APPARATUS FOR DEPOSITING A UNIFORM SILICON FILM WITH FLOW GRADIENT DESIGNS
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Accused Products
Abstract
Methods and apparatus having a flow gradient created from a gas distribution plate are provided. In one embodiment, the method and apparatus are particularly useful for, but not limited to, depositing a silicon film for solar cell applications. The apparatus for depositing a uniform film for solar cell applications includes a processing chamber, and a quadrilateral gas distribution plate disposed in the processing chamber and having at least four corners separated by four sides. The gas distribution plate further includes a first plurality of chokes formed through the gas distribution plate, the first plurality of chokes located in the corners, and a second plurality of chokes formed through the gas distribution plate, the second plurality of chokes located along the sides of the gas distribution plate between the corner regions, wherein the first plurality of chokes have a greater flow resistance than that of the second plurality of chokes.
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Citations
7 Claims
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1-5. -5. (canceled)
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6. An apparatus for depositing films suitable for solar cell applications, comprising:
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a processing chamber; and a quadrilateral gas distribution plate disposed in the processing chamber and having at least four corners separated by four sides, the gas distribution plate further having; a first plurality of chokes formed through the gas distribution plate, the first plurality of chokes located in the corners; and a second plurality of chokes formed through the gas distribution plate, the second plurality of chokes located along the sides of the gas distribution plate between the corner regions, wherein the first plurality of chokes have a greater flow resistance than that of the second plurality of chokes, wherein the second plurality of chokes have a larger diameter than the first plurality of chokes, wherein the chokes formed through the gas distribution plate further have; a passage formed in an upper portion of the plate; and a bore coupling to the passage and having an opening formed in a downstream surface of the plate, wherein the passage has a smaller diameter than a diameter of the bore, and wherein the passage of the second plurality of chokes have a shorter depth than the passage of the first plurality of chokes.
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7-30. -30. (canceled)
Specification