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PLASMA PROCESSING SYSTEM AND USE THEREOF

  • US 20080302761A1
  • Filed: 06/11/2008
  • Published: 12/11/2008
  • Est. Priority Date: 06/11/2007
  • Status: Abandoned Application
First Claim
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1. A plasma processing system that excites a gas using an electromagnetic wave and applies a plasma process to a target object, the system comprising:

  • a processing chamber;

    an electromagnetic source that outputs an electromagnetic wave;

    a dielectric plate on the inner wall of the processing chamber, the dielectric plate transmitting the electromagnetic wave into the processing chamber;

    a conductor rod adjacent to the dielectric plate, the conductor rod transferring the electromagnetic wave to the dielectric plate;

    a metal electrode coupled to the conductor rod to hold the dielectric plate; and

    a device to give the conductor rod a force directed away from the processing chamber.

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