PLASMA PROCESSING SYSTEM, ANTENNA, AND USE OF PLASMA PROCESSING SYSTEM
First Claim
1. A plasma processing system that excites a gas using an electromagnetic wave and applies a plasma process to a target object, the system comprising:
- a processing chamber;
an electromagnetic source that outputs an electromagnetic wave;
a conductor rod that transfers the electromagnetic wave from the electromagnetic source;
a dielectric plate that has a through-hole formed thereon, the dielectric plate transmitting the electromagnetic wave transferred by the conductor rod into the processing chamber; and
a metal electrode that is coupled to the conductor rod via the through-hole formed on the dielectric plate, at least a portion of the metal electrode being adjacent to the surface of the dielectric plate that faces the target object, and the metal electrode being exposed on the surface of the dielectric plate that faces the target object,a surface of the exposed surface of the metal electrode being covered by a dielectric cover.
1 Assignment
0 Petitions
Accused Products
Abstract
A plasma processing system 10 includes a processing chamber 100, a microwave source 900 that outputs a microwave, an inner conductor of a coaxial waveguide 315a that transfers the microwave, a through-hole 305a, a dielectric plate 305 that transmits the microwave transferred through the inner conductor 315a and discharges it into a processing chamber 100, and a metal electrode 310 that is coupled to the inner conductor 315a via the through-hole 305a, the metal electrode 310 being exposed on the surface of the dielectric plate 305 that faces the substrate with at least a portion of the metal electrode 310 being adjacent to the surface of the dielectric plate 305 that faces the substrate. A surface of the exposed surface of the metal electrode 310 is covered by the dielectric cover 320.
-
Citations
26 Claims
-
1. A plasma processing system that excites a gas using an electromagnetic wave and applies a plasma process to a target object, the system comprising:
-
a processing chamber; an electromagnetic source that outputs an electromagnetic wave; a conductor rod that transfers the electromagnetic wave from the electromagnetic source; a dielectric plate that has a through-hole formed thereon, the dielectric plate transmitting the electromagnetic wave transferred by the conductor rod into the processing chamber; and a metal electrode that is coupled to the conductor rod via the through-hole formed on the dielectric plate, at least a portion of the metal electrode being adjacent to the surface of the dielectric plate that faces the target object, and the metal electrode being exposed on the surface of the dielectric plate that faces the target object, a surface of the exposed surface of the metal electrode being covered by a dielectric cover. - View Dependent Claims (3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 24, 25, 26)
-
-
2. A plasma processing system that excites a gas using an electromagnetic wave and applies a plasma process to a target object, the system comprising:
-
a processing chamber; an electromagnetic source that outputs an electromagnetic wave; a conductor rod that transfers the electromagnetic wave from the electromagnetic source; a dielectric plate that has a through-hole formed thereon, the dielectric plate transmitting the electromagnetic wave transferred by the conductor rod into the processing chamber; and a metal electrode that is coupled to the conductor rod via the through-hole formed on the dielectric plate, at least a portion of the metal electrode being adjacent to the surface of the dielectric plate that faces the target object, and the metal electrode being exposed on the surface of the dielectric plate that faces the target object, the exposed surface of the metal electrode does not include a surface that is substantially parallel to the target object.
-
-
20. An antenna comprising:
-
a conductor rod that transfers an electromagnetic wave; a dielectric plate that has a through-hole formed therein, the dielectric plate transmitting the electromagnetic wave transferred by the conductor rod into the processing chamber; and a metal electrode that is coupled to the conductor rod via the through-hole formed on the dielectric plate, at least a portion of the metal electrode being adjacent to the surface of the dielectric plate that faces a target object, and the metal electrode being exposed on the surface of the dielectric plate that faces the target object, a surface of the exposed surface of the metal electrode being covered by a dielectric cover.
-
-
21. An antenna comprising:
-
a conductor rod that transfers an electromagnetic wave; a dielectric plate that has a through-hole formed therein, the dielectric plate transmitting the electromagnetic wave transferred by the conductor rod into the processing chamber; and a metal electrode that is coupled to the conductor rod via the through-hole formed on the dielectric plate, at least a portion of the metal electrode being adjacent to the surface of the dielectric plate that faces a target object, and the metal electrode being exposed on the surface of the dielectric plate that faces the target object, the exposed surface of the metal electrode does not include a surface that is substantially parallel to the target object.
-
-
22. A method of using a plasma processing system, the method comprising:
-
outputting an electromagnetic wave at a frequency of 1 GHz or less from an electromagnetic source, transferring the electromagnetic wave through a conductor rod; transmitting the electromagnetic wave transferred from the conductor rod through a dielectric plate held on an interior wall of a processing chamber and discharging the electromagnetic wave into the processing chamber, the dielectric plate being held on the interior wall by a metal electrode, the metal electrode being coupled to the conductor rod via the through-hole formed on the dielectric plate, at least a portion of the metal electrode being adjacent to the surface of the dielectric plate that faces a target object, and the metal electrode being exposed on the surface of the dielectric plate that faces the target object; and exciting a process gas introduced into the processing chamber using the discharged electromagnetic wave and applying a desired plasma processing on the target object.
-
-
23. A method of cleaning a plasma processing system, the method comprising:
-
outputting an electromagnetic wave at a frequency of 1 GHz or less from an electromagnetic source, transferring the electromagnetic wave through a conductor rod; transmitting the electromagnetic wave transferred from the conductor rod through a dielectric plate held on an interior wall of a processing chamber and discharging the electromagnetic wave into the processing chamber, the dielectric plate being held on the interior wall by a metal electrode, the metal electrode being coupled to the conductor rod via a through-hole formed on the dielectric plate, at least a portion of the metal electrode being adjacent to the surface of the dielectric plate that faces a target object, and the metal electrode being exposed on the surface of the dielectric plate that faces the target object; and exciting a cleaning gas introduced into the processing chamber using the discharged electromagnetic wave and cleaning the plasma processing chamber.
-
Specification