DOSE CONTROL FOR OPTICAL MASKLESS LITHOGRAPHY
First Claim
1. A lithographic apparatus, comprising:
- a patterning device configured to pattern a beam of radiation, the radiation beam comprising a plurality of pulses of radiation;
a projection system configured to project the patterned beam of radiation onto a substrate coated with a layer of radiation sensitive material; and
a controller arranged to control a total energy of a respective pulse in one of the plurality of pulses of the radiation beam, the controller being configured to take into account information indicative a property of the layer of radiation sensitive material on a part of the substrate onto which the radiation beam is to be projected.
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Abstract
A lithographic apparatus comprises a patterning device, a projection system, and a controller. The patterning device is configured to pattern a beam of radiation. The radiation beam comprises a plurality of pulses of radiation. The projection system is configured to project the patterned beam of radiation onto a substrate coated with a layer of radiation sensitive material. The controller is arranged to control a total energy of a respective pulse of the plurality of pulses of the radiation beam. The controller is configured to take into account information indicative of properties of the layer of radiation sensitive material on a part of the substrate onto which the radiation beam is to be projected.
33 Citations
31 Claims
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1. A lithographic apparatus, comprising:
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a patterning device configured to pattern a beam of radiation, the radiation beam comprising a plurality of pulses of radiation; a projection system configured to project the patterned beam of radiation onto a substrate coated with a layer of radiation sensitive material; and a controller arranged to control a total energy of a respective pulse in one of the plurality of pulses of the radiation beam, the controller being configured to take into account information indicative a property of the layer of radiation sensitive material on a part of the substrate onto which the radiation beam is to be projected. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22)
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23. A lithographic method, comprising:
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patterning a beam of radiation, the radiation beam comprising a plurality of pulses of radiation, using a patterning device; projecting the patterned beam of radiation onto a substrate including a radiation sensitive material thereon; and controlling a total energy of a respective pulse in the plurality of pulses of the radiation beam taking into account information indicative of properties of the radiation sensitive material on a part of the substrate onto which the radiation beam is to be projected. - View Dependent Claims (24, 25, 26, 27, 28, 29, 30)
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31. A device manufacturing method, comprising:
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patterning a beam of radiation using a patterning device, the radiation beam comprising a plurality of pulses of radiation; projecting the patterned beam of radiation onto a substrate including radiation sensitive material thereon; and controlling a total energy of a pulse of the radiation beam taking into account information indicative of properties of the radiation sensitive material on a part of the substrate onto which the radiation beam is to be projected.
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Specification