Polymerase chain reaction kit and method of manufacturing the same

• US 20080308529A1
• Filed: 04/28/2008
• Published: 12/18/2008
• Est. Priority Date: 07/05/2002
• Status: Active Grant

• Current Assignee: Matsushita Electric Industrial Company Limited (Panasonic Holdings Corporation)
• Original Assignee: Matsushita Electric Industrial Company Limited (Panasonic Holdings Corporation)
• Inventors: Nakatani, Masaya, Yukimasa, Tetsuo
• Granted Patent: US 7,790,441 B2
• Time in Patent Office: Days
• US Class Current: 216/79
• CPC Class Codes: B01L 2300/0816 Cards, e.g. flat sample carriers usually with flow in two horizontal directions
• CPC Class Codes: B01L 2300/0877 Flow chambers
• CPC Class Codes: B01L 2300/0887 Laminated structure
• CPC Class Codes: B01L 2300/185 using a liquid as fluid
• CPC Class Codes: B01L 3/502707 characterised by the manufacture of the container or its components by shaping or joining plastic parts B29C59/00, B29C65/00; by laminating B32B37/00; manufacture of microstructural devices in general B81C
• CPC Class Codes: B01L 7/52 with provision for submitting samples to a predetermined sequence of different temperatures, e.g. for treating nucleic acid samples amplification or hybridisation processes per se C12Q1/68; controlling sequential reactions for synthesis B01J19/0046
• CPC Class Codes: C07H 21/00 Compounds containing two or more mononucleotide units having separate phosphate or polyphosphate groups linked by saccharide radicals of nucleoside groups, e.g. nucleic acids

Abstract

The present invention provides a kit employed for polymerase chain reaction. The kit has a cavity and a flow channel on a substrate. The flow channel is separated from the cavity by at least a barrier formed along the cavity. Such a structure allows the cavity to be filled with a sample solution even in minute quantities. At the same time, the structure can provide a sample solution with a rapid temperature-control. The structure can therefore contribute to accelerated polymerase chain reaction.

Claims

1-20. -20. (canceled)

21. A method of manufacturing a polymerase chain reaction kit comprising the steps of:

a) forming a cavity and a flow channel for circulating a heating medium separated from the cavity on a surface of a substrate;

b) attaching the substrate to at least one cover plate of a plurality of cover plates;

c) connecting the cavity to a sample-injection inlet exposed to outside; and

d) connecting the flow channel to a flow-in hole and a flow-out hole exposed to outside.

22. The method of manufacturing a polymerase chain reaction kit of claim 21, wherein the cavity and the flow channel are formed through etching employing at least a promotive gas and a suppressive gase in the a) step.

23. The method of manufacturing a polymerase chain reaction kit of claim 21, wherein the cavity and the flow channel are formed in a same surface of the substrate in the a) step.

24. The method of manufacturing a polymerase chain reaction kit of claim 21, wherein at least any one of the sample-injection inlet, the flow-in hole and the flow-out hole is formed in the cover plate.

25. The method of manufacturing a polymerase chain reaction kit of claim 21, wherein the a) step further includes the sub steps of:

a-1) forming the cavity on a first surface of the substrate; and

a-2) forming the flow channel on a second surface opposite to the first surface of the substrate,

and the plurality of cover plates include a first cover plate for sealing the cavity and a second cover plate for sealing the flow channel.

26. The method of manufacturing a polymerase chain reaction kit of claim 25, wherein the sample-injection inlet is formed in the first cover plate, while the flow-in hole and the flow-out hole are formed in the second plate.

27. The method of manufacturing a polymerase chain reaction kit of claim 25 further includes a step of e) forming a layer, which is formed of a material having an etching rate smaller than that of a material forming the substrate, on a inner wall of the cavity.

28. The method of manufacturing a polymerase chain reaction kit of claim 27, wherein the substrate is made of silicon, the layer is made of silicon dioxide, and the layer is formed by any one of i) thermal oxidization, ii) chemical vapor deposition (CVD), and iii) sputtering.

29. The method of manufacturing a polymerase chain reaction kit of claim 27, wherein the substrate is made of silicon, the layer is made of any one of i) gold, ii) platinum, iii) chrome, iv) nickel, and the layer is formed by any one of i) CVD, ii) sputtering, iii) vacuum evaporation, and iv) plating.

30. The method of manufacturing a polymerase chain reaction kit of claim 21, wherein the b) step employs any one of direct attachment and anodic attachment.

31. The method of manufacturing a polymerase chain reaction kit of claim 24, wherein any one of the sample-injection inlet, the flow-in hole and the flow-out hole is formed, by sand blasting, in at least one of the c) step and d) step.