MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND MEASURING DEVICE FOR A PROJECTION LENS
2 Assignments
0 Petitions
Accused Products
Abstract
A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid.
114 Citations
98 Claims
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1-47. -47. (canceled)
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48. An exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate through a liquid, the exposure apparatus comprising:
- a substrate stage which has a substrate-holding member for holding the substrate and which is movable while holding the substrate by the aid of the substrate-holding member; and
a temperature adjustment system which performs temperature adjustment for the substrate-holding member. - View Dependent Claims (49, 50, 51, 52, 53, 54, 55, 56, 57, 62, 68, 76)
- a substrate stage which has a substrate-holding member for holding the substrate and which is movable while holding the substrate by the aid of the substrate-holding member; and
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58. An exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate through a liquid, the exposure apparatus comprising:
- a temperature adjustment system which performs temperature adjustment for an optical member through which the exposure light beam passes in a state in which the optical member makes contact with the liquid.
- View Dependent Claims (59, 60, 61, 63, 64, 93, 94, 96)
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65. An exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate through a liquid, the exposure apparatus comprising:
a substrate stage which is movable while holding the substrate and which has a member forming a flat portion around the substrate; and
a temperature adjustment system which performs temperature adjustment for the member forming the flat portion.- View Dependent Claims (66, 67, 95, 97)
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69. An exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate through a liquid, the exposure apparatus comprising:
a liquid supply mechanism which supplies the liquid; and
a temperature sensor which measures a temperature of an object that makes contact with the liquid supplied from the liquid supply mechanism, wherein;
the liquid supply mechanism adjusts a temperature of the liquid to be supplied on the basis of a measurement result obtained by the temperature sensor.- View Dependent Claims (70, 71, 72, 73, 74, 75, 98)
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77. An exposure method for exposing a substrate through a liquid, the exposure method comprising:
adjusting a temperature of the substrate in consideration of a temperature of the liquid before starting exposure for the substrate; and
exposing the substrate by radiating an exposure light beam onto the substrate through the liquid.- View Dependent Claims (78, 79, 80, 81, 82, 83, 84, 85)
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86. An exposure method for exposing a substrate through a liquid, the exposure method comprising:
adjusting a temperature of an object which includes the substrate and makes contact with the liquid, on the basis of a predetermined temperature; and
exposing the substrate through the liquid which has the predetermined temperature.- View Dependent Claims (87, 88, 89)
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90. An exposure method for exposing a substrate by radiating an exposure light beam onto the substrate through a liquid, the exposure method comprising:
supplying the liquid; and
adjusting a temperature of the liquid to be supplied, on the basis of a temperature of an object which makes contact with the supplied liquid.- View Dependent Claims (91, 92)
Specification