Dynamic fluid control system for immersion lithography
First Claim
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1. An apparatus comprising:
- a stage that supports a substrate;
an optical system having a last optical element, that projects an image onto the substrate that is positioned spaced apart from the last optical element by a gap at least partly filled with an immersion liquid; and
a pressure control system having an actuator, that controls pressure of the immersion liquid in the gap using the actuator.
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Abstract
An apparatus includes a stage that supports a substrate, an optical system having a last optical element, that projects an image onto the substrate that is positioned spaced apart from the last optical element by a gap at least partly filled with an immersion liquid, and a pressure control system having an actuator, that controls pressure of the immersion liquid in the gap using the actuator.
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Citations
25 Claims
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1. An apparatus comprising:
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a stage that supports a substrate; an optical system having a last optical element, that projects an image onto the substrate that is positioned spaced apart from the last optical element by a gap at least partly filled with an immersion liquid; and a pressure control system having an actuator, that controls pressure of the immersion liquid in the gap using the actuator. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18)
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19. A method of controlling an immersion lithography apparatus in which and optical system having a last optical element projects an image onto a substrate held by a stage and spaced from the last optical element, the image being projected through an immersion liquid disposed in at least a part of a gap between the last optical element and the substrate, the method comprising:
controlling a pressure of the immersion liquid in the gap using an actuator that communicates with the immersion liquid in the gap. - View Dependent Claims (20, 21, 22, 23, 24, 25)
Specification