Illumination of a Patterning Device Based on Interference for Use in a Maskless Lithography System

• US 20080309906A1
• Filed: 06/14/2007
• Published: 12/18/2008
• Est. Priority Date: 06/14/2007
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Visser, Huibert, Van Brug, Hedser
• Granted Patent: US 7,768,627 B2
• Time in Patent Office: Days
• US Class Current: 355/70
• CPC Class Codes: G03F 7/70208 Multiple illumination paths, e.g. radiation distribution devices, microlens illumination systems, multiplexers or demultiplexers for single or multiple projection systems
• CPC Class Codes: G03F 7/70291 Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
• CPC Class Codes: G03F 7/70583 Speckle reduction, e.g. coherence control or amplitude/wavefront splitting

Abstract

A lithographic apparatus in which beams of radiation are projected onto an array of individually controllable elements, such that the beams interfere. Radiation that is further modulated by the array of individually controllable elements is projected onto a substrate.

Claims

1. A lithographic apparatus, comprising:

an array of individually controllable elements;

an interference projection system that is configured to project at least two beams of radiation onto the array of individually controllable elements, such that the beams of radiation interfere at a surface of the array of individually controllable elements;

wherein the array of individually controllable elements is configured to modulate the radiation projected onto the array by the interference projection system; and

a projection system, configured to project onto a substrate the radiation modulated by the array of individually controllable elements.

2. The lithographic apparatus of claim 1, wherein:

the interference projection system is configured to project two beams of radiation onto the array of individually controllable elements, such that the radiation incident on the array comprises a plurality of interference fringes parallel to a first direction; and

each individually controllable element of the array of individually controllable elements comprises a reflector configured to be rotatable about an axis of rotation parallel to the first direction.

3. The lithographic apparatus of claim 2, wherein the interference projection system is configured to project the two beams of radiation onto the array of individually controllable elements, such that a period of the interference fringes, measured in a direction perpendicular to the first direction, equals half the separation of the axes of rotation of adjacent reflectors of the array of individually controllable elements, measured in the direction perpendicular to the first direction.

4. The lithographic apparatus of claim 3, wherein:

the reflectors are configured such first and second parts of each of the reflectors are arranged on first and second sides, respectively, of the axis of rotation of the reflector; and

the interference projection system is configured to project the two beams of radiation onto the array of individually controllable elements, such that a band of maximum radiation intensity within the interference fringes is incident on each of the first and second parts of each of the reflectors.

5. The lithographic apparatus of claim 1, wherein the interference projection system comprises:

one or more optical elements configured to adjust;

(a) a relative angle of the beams of radiation at the surface of the array of individually controllable elements, (b) a position of one or more of the beams of radiation, relative to the array of individually controllable elements, at which the one or more beams of radiation are incident on the array, (c) a relative phase of the beams of radiation or (d) a relative intensity of the beams of radiation.

6. The lithographic apparatus of claim 5, wherein the one or more optical elements comprises a variable radiation intensity attenuator.

7. The lithographic apparatus of claim 5, wherein the one or more optical elements comprises a lens, prism or a reflector and an actuator, the actuator being configured to adjust a position of the lens, prism or reflector.

8. The lithographic apparatus of claim 7, further comprising an interference projection system controller configured to control the actuators of the one or more optical elements in order to adjust the interference pattern projected onto the array of individually controllable elements by the interference projection system.

9. The lithographic apparatus of claim 1, further comprising a radiation sensor configured to inspect the interference pattern projected by the interference projection system.

10. The lithographic apparatus of claim 9, wherein the radiation sensor is located adjacent the array of individually controllable elements, such that the radiation sensor inspects the interference pattern being projected onto the array.

11. The lithographic apparatus of claim 9, further comprising:

an actuator system configured to switch the lithographic apparatus between a first configuration, in which the interference projection system projects radiation onto the array of individually controllable elements, and a second configuration, in which the interference projection system projects radiation onto the radiation sensor, such that the radiation sensor inspects the interference pattern that would be projected onto the array of individually controllable elements if the lithographic apparatus were in the first configuration.

12. The lithographic apparatus of claim 1, further comprising:

an actuator configured to adjust a position of the array of individually controllable elements relative to the beams of radiation projected onto the array by the interference projection system.

13. The lithographic apparatus of claim 1, wherein the interference projection system comprises a radiation beam divider configured to divide a beam of radiation into the at least two beams of radiation projected into the array of individually controllable elements.

14. The lithographic apparatus of claim 1, wherein the interference projection system is configured to project four beams of radiation onto the array of individually controllable elements, such that the radiation incident on the array comprises a checker-board interference pattern.

15. A device manufacturing method, comprising:

projecting at least two beams of radiation onto an array of individually controllable elements, such that the beams of radiation interfere at a surface of the array of individually controllable elements;

modulating the radiation incident on the array of individually controllable elements using the array; and

projecting onto a substrate the modulated radiation.