REFLECTOR FILM AND PRODUCTION METHOD THEREOF, AND LIGHTING APPARATUS USING THE SAME
First Claim
Patent Images
1. A reflector film comprising:
- at least one of a silver film and a silver alloy film; and
at least one film selected from the group consisting of a titanium film, a titanium alloy film, and a SiAlON (general formula Si(6-Z)AlZOZN(8-Z) (0<
Z≦
4.2)) film serving as a protective film deposited on the at least one of the silver film and the silver alloy film.
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Abstract
A reflector film can have a high heat resistance and can maintain a high reflectance (or effectively prevent the decrease in the reflectance) when overlaid with a particular protective film. A lighting apparatus can also be configured for use with such a reflector film. The reflector film can include a silver or silver alloy film deposited on a substrate, and a titanium or titanium alloy film deposited on the silver or silver alloy film to serve as a protective film.
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Citations
23 Claims
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1. A reflector film comprising:
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at least one of a silver film and a silver alloy film; and at least one film selected from the group consisting of a titanium film, a titanium alloy film, and a SiAlON (general formula Si(6-Z)AlZOZN(8-Z) (0<
Z≦
4.2)) film serving as a protective film deposited on the at least one of the silver film and the silver alloy film. - View Dependent Claims (2, 3)
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4. A reflector comprising:
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a substrate having a predetermined shape; at least one of a silver film and a silver alloy film deposited on the substrate; and at least one film selected from the group consisting of a titanium film, a titanium alloy film, and a SiAlON (general formula Si(6-Z)AlZOZN(8-Z) (0<
Z≦
4.2)) film serving as a protective film and deposited on the at least one of the silver film and silver alloy film. - View Dependent Claims (5, 6, 7, 8, 9, 10, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23)
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11. A method for producing a reflector film, comprising:
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providing a substrate; depositing at least one of a silver and a silver alloy film on the substrate by sputtering; and subsequently depositing at least one film selected from the group consisting of a titanium film, a titanium alloy film, and a SiAlON (general formula Si(6-z)AlZOZN(8-z) (0<
Z≦
4.2)) film by sputtering.
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Specification