Electron beam inspection method and electron beam inspection apparatus
First Claim
1. An electron beam inspection apparatus including:
- an electron optical system that irradiates an electron beam, which is emitted from an electron source, to a range covering a field of view on a sample;
means for applying a voltage to the sample;
electron beam imaging means for converging electrons, which are reflected from the sample due to the irradiated electron beam, so as to acquire a reflected-electron image;
means that has the sample mounted thereon and moves the sample with respect to the irradiated electron beam;
means that uses the reflected-electron beam to extract a foreign matter or defect on the sample, and records the position of the foreign matter or defect or an image thereof; and
an ultraviolet irradiation system that irradiates ultraviolet rays to the sample, comprising;
means for adjusting so that the shape of the irradiated area of the electron beam includes the shape of the irradiated area of the ultraviolet rays; and
means for adjusting the intensity of the ultraviolet rays in the irradiated area of the electron beam while sustaining the reflected-electron imaging conditions for the reflected-electron image.
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Accused Products
Abstract
An electron beam inspection apparatus images reflected electrons and cancels negative charging derived from electron-beam irradiation. Ultraviolet rays are irradiated and an irradiated area of ultraviolet rays is displayed as a photoelectron image. The photoelectron image and a reflected-electron image are displayed on a monitor while being superposed on each other, to easily grasp the positional relationship between the images and the difference in size between them. Specifically, the shape of the irradiated area of an electron beam includes the shape of the irradiated area of ultraviolet rays on a display screen. The intensity of the ultraviolet rays in the irradiated area of the electron beam is adjusted while the reflected-electron imaging conditions for the reflected-electron image are sustained. Moreover, an amount-of-ultraviolet ray adjustment mechanism is controlled on the monitor so that an amount of the ultraviolet rays is adjusted while observing a reflected-electron image obtained during ultraviolet irradiation.
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Citations
15 Claims
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1. An electron beam inspection apparatus including:
- an electron optical system that irradiates an electron beam, which is emitted from an electron source, to a range covering a field of view on a sample;
means for applying a voltage to the sample;
electron beam imaging means for converging electrons, which are reflected from the sample due to the irradiated electron beam, so as to acquire a reflected-electron image;
means that has the sample mounted thereon and moves the sample with respect to the irradiated electron beam;
means that uses the reflected-electron beam to extract a foreign matter or defect on the sample, and records the position of the foreign matter or defect or an image thereof; and
an ultraviolet irradiation system that irradiates ultraviolet rays to the sample, comprising;means for adjusting so that the shape of the irradiated area of the electron beam includes the shape of the irradiated area of the ultraviolet rays; and means for adjusting the intensity of the ultraviolet rays in the irradiated area of the electron beam while sustaining the reflected-electron imaging conditions for the reflected-electron image. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
- an electron optical system that irradiates an electron beam, which is emitted from an electron source, to a range covering a field of view on a sample;
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9. An electron beam inspection apparatus including:
- an electron optical system that shapes an electron beam, which is emitted from an electron source, into a planar electron beam, and irradiates the planar electron beam to a range covering a field of view on a sample;
means for applying a negative voltage to the sample;
an electron-beam imaging means that converges electrons, which are reflected from the sample due to the irradiated electron beam, so as to acquire a reflected-electron image;
means that has the sample mounted thereon and moves the sample with respect to the irradiated electron beam;
means that uses the reflected-electron image to extract a foreign matter or defect on the sample, and records the position of the foreign matter or defect or an image thereof; and
an ultraviolet irradiation system that irradiates ultraviolet rays to the sample, comprising;means for adjusting so that the shape of the irradiated area of the electron beam includes the shape of the irradiated area of the ultraviolet rays; and means for adjusting the intensity of the ultraviolet rays in the irradiated area of the electron beam while sustaining the reflected-electron imaging conditions for the reflected-electron image, wherein negative charging in the irradiated area of the electron beam derived from the irradiated electron beam is neutralized.
- an electron optical system that shapes an electron beam, which is emitted from an electron source, into a planar electron beam, and irradiates the planar electron beam to a range covering a field of view on a sample;
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10. An electron beam inspection method including:
- a step of irradiating an electron beam to a range covering a field of view on a sample, to which a voltage is applied, through an electron optical system;
a step of converging electrons, which are reflected from the sample due to the irradiation of the electron beam, so as to acquire a reflected-electron image;
a step of extracting a foreign matter or defect on the sample using the reflected-electron image, and recording and displaying the position of the foreign matter or defect or an image thereof; and
a step of alleviating negative charging on the sample, which is derived from the electron-beam irradiation, by irradiating ultraviolet rays, comprising the steps of;limiting the shape of the irradiated area of the electron beam in the shape of the irradiated area of the ultraviolet rays; and adjusting an amount of ultraviolet rays in the irradiated area of the electron beam while sustaining the reflected-electron imaging conditions for the reflected-electron image. - View Dependent Claims (11, 12, 13, 14, 15)
- a step of irradiating an electron beam to a range covering a field of view on a sample, to which a voltage is applied, through an electron optical system;
Specification