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Silicon Wafer Having Through-Wafer Vias

  • US 20080315368A1
  • Filed: 09/02/2008
  • Published: 12/25/2008
  • Est. Priority Date: 05/04/2005
  • Status: Active Grant
First Claim
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1. A semiconductor device comprising:

  • a semiconductor substrate having first and second main surfaces opposite to each other;

    at least one conductive via extending from the first main surface through the semiconductor substrate to the second main surface;

    a dielectric lining surrounding the at least one conductive via through the semiconductor substrate, the at least one conductive via being electrically isolated from the semiconductor substrate by the dielectric liner;

    an electrical component electrically connected to the at least one conductive via at the first main surface; and

    a cap sealed to the first main surface, the cap enclosing at least a portion of the electrical component and the electrical connection between the electrical component and the at least one conductive via.

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