Stage apparatus and exposure apparatus

• US 20080316446A1
• Filed: 02/04/2008
• Published: 12/25/2008
• Est. Priority Date: 08/05/2005
• Status: Abandoned Application

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Shibazaki, Yuichi
• Application Number:
  US12/068,199
• Publication Number:
  US 20080316446A1
• Time in Patent Office: Days
• US Class Current: 355/53
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/70725 control
• CPC Class Codes: G03F 9/7007 Alignment other than original with workpiece
• CPC Class Codes: H01L 21/682 Mask-wafer alignment in general G03F7/70, G03F9/70

Abstract

A wafer stage and a measurement stage are configured so that they are movable along an upper surface of a base plate, and water is transferred therebetween by bringing the stages proximate to one another and moving them integrally in the Y directions. An alignment system measures mutually proximate edge parts of the wafer stage and the measurement stage, and a focus leveling detection system measures a step in the Z directions in a state wherein the wafer stage and the measurement stage are proximate to one another. When both stages are brought proximate to one another, the relative position between the wafer stage and the measurement stage is adjusted based on the measurement results.

Claims

1. A stage apparatus, comprising:

first and second stages that move along a base surface;

a first measurement apparatus that measures a first gap between the first and second stages along a first direction that intersects the base surface; and

a first adjustment apparatus that adjusts the first gap based on a measurement result of the first measurement apparatus.

2. A stage apparatus according to claim 1, wherein

the first adjustment apparatus adjusts the position of at least one stage of the first and second stages in the first direction when the first and second stages are proximate to one another.

3. A stage apparatus according to claim 1, wherein

the first adjustment apparatus adjusts the position of at least one stage of the first and second stages in the first direction so that the first gap is less or equal to 0.1 mm.

4. A stage apparatus according to claim 1, wherein

the first direction is orthogonal to the base surface.

5. A stage apparatus according to claim 1, further comprising:

a second measurement apparatus that measures a second gap between the first and second stages along the base surface; and

a second adjustment apparatus that adjusts the second gap based on a measurement result of the second measurement apparatus.

6. A stage apparatus according to claim 5, wherein

the second adjustment apparatus adjusts the position of at least one stage of the first and second stages along the base surface so that the second gap is less or equal to 0.5 mm.

10. A stage apparatus according to claim 1, wherein

part of the first stage or part of the second stage projects toward the other stage.

11. An exposure apparatus that exposes a substrate through a liquid, comprising:

a stage apparatus according to claim 1,

wherein the first measurement apparatus measures the first gap without transiting through the liquid.

13. An exposure apparatus according to claim 11, wherein

the first stage is a substrate stage that holds the substrate;

and the second stage is a measurement stage that measures information related to the exposure.

14. A device fabricating method that comprises an exposure process, wherein

an exposure apparatus according to claim 11 is used.

27. An immersion exposure method, comprising:

supplying a stage apparatus according to claim 1;

measuring a positional relationship between first and second stages of the stage apparatus without transiting through a liquid; and

exposing a substrate, which is held by the first stage, through a liquid.

7. A stage apparatus, comprising:

first and second stages that move along a base surface;

a measuring apparatus that measures the positions of the first and second stages along the base surface;

a detection apparatus that detects an edge of an upper surface of the first stage and an edge of an upper surface of the second stage; and

an adjustment apparatus that adjusts the position of at least one stage of the first and second stages along the base surface based on a measurement result of the measuring apparatus and a detection result of the detection apparatus.

8. A stage apparatus according to claim 7, wherein

the adjustment apparatus adjusts the position of at least one stage of the first and second stages along the base surface so that a first gap between the first and second stages along the base surface is less or equal to 0.5 mm.

9. A stage apparatus according to claim 7, further comprising:

a calculation apparatus that derives, based on the detection result of the detection apparatus, a second gap between the first and second stages along a direction that intersects the base surface.

12. An exposure apparatus that exposes a substrate through a liquid, comprising:

a stage apparatus according to claim 7;

wherein the detection apparatus detects an edge of an upper surface of the first stage and detects an edge of the upper surface of the second stage without transiting through the liquid.

15. A method of moving an immersion area between a first member and a second member, which are capable of relative movement, in order to perform an immersion exposure, comprising:

measuring a positional relationship between the first member and the second member; and

moving a liquid between the first member and the second member after the measurement of the positional relationship.

16. A method according to claim 15, wherein

the measurement of the positional relationship comprises adjusting the positional relationship between the first member and the second member based on the measurement result of the positional relationship.

26. A device fabricating method that comprises an exposure process, wherein

an exposing method according to claim 15 is used.

17. An immersion exposure method, comprising:

measuring a positional relationship between a first member, which holds a substrate, and a second member, which is capable of moving relative to the first member;

moving a liquid between the first member and the second member after the measurement of the positional relationship; and

exposing the substrate through a liquid.

18. An immersion exposure method according to claim 17, wherein

the measurement of the positional relationship comprises adjusting the positional relationship between the first member and the second member based on the measurement result of the positional relationship.

19. An immersion exposure method according to claim 18, wherein

the first and second members are capable of moving along a base surface;

the measurement of the positional relationship comprises measuring a first gap between the first and second members in a first direction that intersects the base surface; and

the adjustment of the positional relationship comprises adjusting the first gap based on the measurement result of the first gap.

20. An immersion exposure method according to claim 19, wherein

the adjustment of the positional relationship comprises adjusting the position of at least one of the first and second members in the first direction so that the first gap is less or equal to 0.1 mm.

21. An immersion exposure method according to claim 19, wherein

the exposure of the substrate comprises filling a space between an optical member and the first member with the liquid, the first direction being substantially parallel to an optical axis of the optical member.

22. An immersion exposure method according to claim 18, wherein

the first and second members are capable of moving along a base surface;

the measurement of the positional relationship comprises measuring a second gap between the first and second members along the base surface; and

the adjustment of the positional relationship comprises adjusting the second gap based on the measurement result of the second gap.

23. An immersion exposure method according to claim 22, wherein

the adjustment of the positional relationship comprises adjusting the position of at least one of the first and second members along the base surface so that the second gap is less or equal to 0.5 mm.

24. An immersion exposure method according to claim 18, wherein

the first and second members are capable of moving along a base surface;

the measurement of the positional relationship comprises measuring the positions of the first and second members along the base surface, and detecting an edge of an upper surface of the first member and an edge of an upper surface of the second member; and

the adjustment of the positional relationship comprises adjusting the position of at least one of the first and second members along the base surface based on the measurement of the positions and the detection of the edges.

25. An immersion exposure method according to claim 17, wherein

the measurement of the positional relationship is executed without transiting through the liquid.