MANIFOLD ASSEMBLY

• US 20090000550A1
• Filed: 06/29/2007
• Published: 01/01/2009
• Est. Priority Date: 06/29/2007
• Status: Abandoned Application

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Tran, Toan Q., Tsuei, Lun, Lubormirsky, Dimitry
• Application Number:
  US11/770,737
• Publication Number:
  US 20090000550A1
• Time in Patent Office: Days
• US Class Current: 118/715
• CPC Class Codes: F16L 59/184 Flanged joints in general F16L23/00
• CPC Class Codes: Y10T 137/87571 Multiple inlet with single outlet
• CPC Class Codes: Y10T 137/9029 With coupling

Abstract

Embodiments of a manifold assembly are provided herein. In some embodiments, a manifold assembly includes a first manifold having a first inlet, for coupling to a high temperature fluid source, and a first outlet; a second manifold having a second inlet and a second outlet; and a connector portion coupling the first outlet of the first manifold to the second inlet of the second manifold, the connector portion includes a polymer block; and a thermal isolator disposed between the polymer block and the first manifold.

Claims

1. A manifold assembly, comprising:

a first manifold having a first inlet, for coupling to a high temperature fluid source, and a first outlet;

a second manifold having a second inlet and a second outlet; and

a connector portion coupling the first outlet of the first manifold to the second inlet of the second manifold, the connector portion comprising;

a polymer block; and

a thermal isolator disposed between the polymer block and the first manifold.

2. The manifold assembly of claim 1, wherein the polymer block comprises polytetrafluoroethylene (PTFE).

3. The manifold assembly of claim 1, wherein the thermal isolator comprises ceramic.

4. The manifold assembly of claim 1, wherein the high temperature fluid source is a remote plasma source.

5. The manifold assembly of claim 1, wherein second manifold further comprises a plurality of cooling channels formed therein.

6. The manifold assembly of claim 1, wherein second manifold further comprises a second inlet for coupling to a second fluid source.

7. The manifold assembly of claim 1, wherein first manifold comprises aluminum.

8. The manifold assembly of claim 1, wherein second manifold comprises aluminum.

9. The manifold assembly of claim 1, further comprising:

a tube disposed within the polymer block.

10. The manifold assembly of claim 9, wherein the tube comprises aluminum.

11. The manifold assembly of claim 9, wherein the tube extends into the second manifold.

12. A substrate processing apparatus, comprising:

a process chamber;

a remote plasma source; and

a manifold assembly coupling the remote plasma source to the chamber, the manifold assembly comprising;

a first manifold having a first inlet, for coupling to the remote plasma source, and a first outlet;

a second manifold having a second inlet and a second outlet; and

a connector portion coupling the first outlet of the first manifold to the second inlet of the second manifold, the connector portion comprising;

a polymer block; and

a thermal isolator disposed between the polymer block and the first manifold.

13. The substrate processing apparatus of claim 12, wherein the polymer block comprises polytetrafluoroethylene (PTFE).

14. The substrate processing apparatus of claim 12, wherein the thermal isolator comprises ceramic.

15. The substrate processing apparatus of claim 12, wherein second manifold further comprises a plurality of cooling channels formed therein.

16. The substrate processing apparatus of claim 12, wherein second manifold further comprises a second inlet for coupling to a second fluid source.

17. The substrate processing apparatus of claim 12, wherein first manifold comprises aluminum.

18. The substrate processing apparatus of claim 12, wherein second manifold comprises aluminum.

19. The substrate processing apparatus of claim 12 further comprising a tube disposed within the polymer block.

20. The substrate processing apparatus of claim 19, wherein the tube comprises aluminum.

21. The substrate processing apparatus of claim 19, wherein the tube extends into the second manifold.