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SUBSTRATE PROCESSING APPARATUS AND SHOWER HEAD

  • US 20090000743A1
  • Filed: 06/26/2008
  • Published: 01/01/2009
  • Est. Priority Date: 06/27/2007
  • Status: Abandoned Application
First Claim
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1. A substrate processing apparatus comprising:

  • a processing chamber accommodating therein a substrate to be processed;

    a mounting table disposed in the processing chamber, for mounting thereon the substrate to be processed;

    a shower head provided opposite to the mounting table, for injecting a processing gas into the processing chamber;

    a gas exhaust unit for exhausting an inside of the processing chamber; and

    a processing unit for performing a predetermined processing on the substrate to be processed in the processing chamber,wherein the shower head includes;

    an upper plate made of a metal and having a gas inlet hole;

    a lower plate made of a metal and having a plurality of gas through holes;

    a gas diffusion space formed between the upper plate and the lower plate;

    a cover member made of ceramic and having a plurality of gas injection openings positioned to correspond to the gas through holes, for covering a bottom surface of the lower plate; and

    a plurality of thermally conductive members provided to connect the upper plate with the lower plate in the gas diffusion space, for transferring heat generated by the processing of the processing unit upward.

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