SILICON PHOTODETECTOR AND METHOD FOR FORMING THE SAME
First Claim
1. A method for fabricating a silicon photodetector, comprising the steps of:
- forming a prototype of the silicon photodetector by using a traditional process for forming a complemented metal oxide semiconductor (CMOS) process; and
applying a process for forming a micro-electromechanical system manufacturing process onto the prototype to eliminate a substrate formed under a bottom of the prototype, wherein the micro-electromechanical system process is a lateral etching process.
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Abstract
A structure of a silicon photodetector and a method for forming the same by using the conventional CMOS semiconductor manufacturing process and micro-electromechanical system manufacturing process, in which the micro-electromechanical system manufacturing process (lateral etching process) is applied for elimination of effect and interference caused by a substrate of the silicon photodetector after optical absorption thereof, thereby greatly improving the response speed of the silicon photodetector. This can be done only by applying the lateral etching process onto a portion of the substrate of the silicon photodetector after the semiconductor manufacturing process is finished, through which slow diffusion carriers produced from the optical absorption of the substrate can be effectively reduced and the response speed is thus enhanced.
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Citations
3 Claims
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1. A method for fabricating a silicon photodetector, comprising the steps of:
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forming a prototype of the silicon photodetector by using a traditional process for forming a complemented metal oxide semiconductor (CMOS) process; and applying a process for forming a micro-electromechanical system manufacturing process onto the prototype to eliminate a substrate formed under a bottom of the prototype, wherein the micro-electromechanical system process is a lateral etching process. - View Dependent Claims (2, 3)
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Specification