IMMERSION EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
First Claim
1. An immersion exposure apparatus for exposing a substrate through a liquid comprising:
- an illumination optical system configured to illuminate an original with exposure light from an exposure light source;
a projection optical system configured to project a pattern of the original onto the substrate;
a chuck configured to hold the substrate;
a liquid support plate configured to support the liquid together with the substrate held by the chuck, a surface of the liquid support plate including a surface of a metal oxide;
a movable stage including the chuck and the liquid support plate; and
a liquid repellency recovery unit configured to recover a liquid repellency of the surface of the metal oxide with respect to the liquid.
1 Assignment
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Accused Products
Abstract
An immersion exposure apparatus which exposes a substrate through a liquid includes an illumination optical system, a projection optical system, a chuck, a liquid support plate, a stage, and a liquid repellency recovery unit. The illumination optical system illuminates an original with exposure light from exposure light sources. The projection optical system projects a pattern of the original onto the substrate. The chuck holds the substrate. The liquid support plate supports a liquid together with the substrate held by the chuck. A surface of the liquid support plate includes a surface of a metal oxide. The stage is provided with a chuck and the liquid support plate and is movable. The liquid repellency recovery unit is configured to recover the liquid repellency of the surface of the metal oxide with regard to the liquid.
26 Citations
11 Claims
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1. An immersion exposure apparatus for exposing a substrate through a liquid comprising:
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an illumination optical system configured to illuminate an original with exposure light from an exposure light source; a projection optical system configured to project a pattern of the original onto the substrate; a chuck configured to hold the substrate; a liquid support plate configured to support the liquid together with the substrate held by the chuck, a surface of the liquid support plate including a surface of a metal oxide; a movable stage including the chuck and the liquid support plate; and a liquid repellency recovery unit configured to recover a liquid repellency of the surface of the metal oxide with respect to the liquid. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. A device manufacturing method utilizing an immersion exposure apparatus for exposing a substrate through a liquid including an illumination optical system configured to illuminate an original with exposure light from an exposure light source;
- a projection optical system configured to project a pattern of the original onto the substrate;
a chuck configured to hold the substrate;
a liquid support plate configured to support the liquid together with the substrate held by the chuck, a surface of the liquid support plate including a surface of a metal oxide;
a movable stage including the chuck and the liquid support plate; and
a liquid repellency recovery unit configured to recover a liquid repellency of the surface of the metal oxide with respect to the liquid;
the method comprising;exposing a substrate to light using the immersion exposure apparatus; and developing the exposed substrate.
- a projection optical system configured to project a pattern of the original onto the substrate;
Specification