Exposure apparatus and device manufacturing method

• US 20090002660A1
• Filed: 08/22/2008
• Published: 01/01/2009
• Est. Priority Date: 07/09/2003
• Status: Abandoned Application

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Kiuchi, Tohru
• Application Number:
  US12/230,073
• Publication Number:
  US 20090002660A1
• Time in Patent Office: Days
• US Class Current: 355/53
• CPC Class Codes: G02B 7/021 for more than one lens
• CPC Class Codes: G02B 7/023 permitting adjustment
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/70825 Mounting of individual elements, e.g. mounts, holders or supports workpiece or mask holders G03F7/707
• CPC Class Codes: G03F 7/709 Vibration, e.g. vibration detection, compensation, suppression or isolation

Abstract

An exposure apparatus projects a pattern image onto a substrate via a projection optical system and a liquid, and the projection optical system has an optical member that comes into contact with the liquid and an optical group arranged between the optical member and a reticle. A holding mechanism that holds the optical member and the optical group holds the optical member so that it is movable relative to the optical group.

Claims

1. An exposure apparatus comprising:

a projection optical system that includes an optical member that comes into contact with a liquid and an optical group arranged between said optical member and a pattern and that projects an image of said pattern onto a substrate via said liquid, and

a holding mechanism that holds said optical member and said optical group, wherein

said holding mechanism holds said optical member so as to be movable relative to said optical group.