Focus determination for laser-mask imaging systems

• US 20090002687A1
• Filed: 06/29/2007
• Published: 01/01/2009
• Est. Priority Date: 06/29/2007
• Status: Active Grant

• Current Assignee: Coherent GmbH (Coherent Corp.)
• Original Assignee: Coherent GmbH (Coherent Corp.)
• Inventors: Wenzel, Thomas
• Granted Patent: US 7,659,989 B2
• Time in Patent Office: Days
• US Class Current: 356/73
• CPC Class Codes: B23K 26/046 Automatically focusing the laser beam
• CPC Class Codes: B23K 26/066 by using masks
• CPC Class Codes: H01L 21/02667 Crystallisation or recrystallisation of non-monocrystalline semiconductor materials, e.g. regrowth
• CPC Class Codes: H01L 21/0268 Shape of mask
• CPC Class Codes: H01L 21/02686 Pulsed laser beam
• CPC Class Codes: H01L 22/12 for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions electrical measurement of diffusions H01L22/14
• CPC Class Codes: H01L 22/20 Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps

Abstract

A system and method for calibrating the focal position of the imaging plane of a sequential lateral solidification (SLS) system. A test pattern is formed on a test substrate while varying the z-position of the focal position. Information concerning the z-position of the focal position is stored by a data processing system for various positions in the test pattern. An inspection light beam is directed onto the test pattern at a predetermined angle. The reflection of the inspection light beam is detected by an optical detector. The data processing system analyzes the reflection and determines whether the reflected light is substantially specular or substantially scattered. The data processing system uses the analysis of the reflected light and the information concerning the z-position of the focal position to select an optimal focal position for calibrating the SLS system.

Claims

1. A method of calibrating a focal plane of a mask imaging system for use with a sequential lateral solidification (SLS) system, the method comprising:

utilizing the SLS system to form a test pattern in a substrate by directing a mask image onto said substrate in a predetermined pattern;

varying a z-position of the focal position of the SLS system while forming the test pattern;

storing information concerning the variation of the focal position in a data processing system;

directing an inspection beam of collimated light onto the test pattern at a predetermined angle;

detecting a reflection of the inspection beam with an optical detector;

analyzing the reflection to determine if the reflection is substantially specular or substantially scattered; and

comparing the analysis of the reflection with the stored information to select one of the z-positions as a calibration.

2. The method of claim 1, wherein the forming of the test pattern comprises forming a first pattern with a first focal position and forming a second pattern with a second focal position, wherein the second focal position differs from the first focal position by a predetermined amount.

3. The method of claim 2, wherein the predetermined amount is a fixed step size.

4. The method of claim 3, wherein the fixed step size is 5 micrometers.

5. The method of claim 1, and further comprising the step of automatically calibrating the system based on the calibration focal position.

6. The method of claim 1, and wherein the test pattern comprises a plurality of substantially parallel rectangular areas.

7. An SLS system, comprising:

an xyz-translation stage for manipulating the x, y and z position of a substrate;

a laser for generating a laser beam to form a test pattern in the substrate, the laser having a focal position;

a data processing system for storing information concerning the z-position of the focal position during the formation of said test pattern;

a light source for generating an inspection light beam and for directing the inspection light beam onto the test pattern;

an optical detector for detecting a reflection of the inspection light beam that is reflected from the test pattern; and

wherein the data processing system analyzes the reflection to determine if the reflection is substantially specular or substantially scattered and the data processing system compares the information concerning the z-positions of the focal position utilized during the formation of the test pattern with the results of the analysis of the reflection to select an optimal focal position for calibrating the SLS system.

8. The SLS system of claim 7, and wherein the laser comprises an excimer laser.

9. The SLS system of claim 7, wherein the data processing system is integral to the SLS system.

10. The SLS system of claim 7, wherein the data processing system is separate from the SLS system.

11. The SLS system of claim 7, wherein the test pattern comprises a plurality of substantially parallel rectangular areas.

12. A calibration system for calibrating a focal position of a laser of an SLS system, the calibration system comprising:

a laser for generating a laser beam for forming a test pattern in a substrate, the laser having a focal position;

a translation stage for varying a z-position of the focal position of the laser while forming the test pattern;

a data processing system for storing information concerning the variation of the focal position;

means for directing an inspection beam of collimated light onto the test pattern at a predetermined angle;

means for detecting a reflection of the inspection beam; and

wherein the data processing system includes a program for analyzing the reflection to determine if the reflection is substantially specular or substantially scattered and for comparing results of the analysis with the stored information to select a specific z-position as a calibration focal position for the laser.

13. The calibration system of claim 12, and wherein the laser comprises an excimer laser.

14. The calibration system of claim 12, and wherein the data processing system is integral to the SLS system.

15. The calibration system of claim 12, and wherein the data processing system is separate from the SLS system.

16. The calibration system of claim 12, and wherein the test pattern comprises a plurality of substantially parallel rectangular areas.