In-Line Gas Purity Monitoring and Control System
First Claim
1. A method for supplying a high purity gas product comprising(a) providing a first gas stream comprising a major component and at least one impurity component;
- (b) determining the concentration of the at least one impurity component and comparing the concentration so determined with a reference concentration for that component;
(c) when the value of the concentration so determined is less than or equal to the reference concentration, utilizing the first gas stream to provide the high purity gas product; and
(d) when the value of the concentration so determined is greater than the reference concentration,(1) providing a second gas stream comprising the major component, wherein the second gas stream is provided by dividing the first gas stream into a first substream and a second substream, removing at least a portion of the at least one impurity component in the first substream to provide a purified substream, and mixing the purified substream with the second substream to provide the high purity gas product; and
(2) mixing the first gas stream with the second gas stream to yield a mixed gas stream having a concentration of the at least one impurity component that is less than the reference concentration, and utilizing the mixed gas stream to provide the high purity gas product.
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Abstract
Method for supplying a high purity gas product comprising providing a first gas stream including a major component and at least one impurity component, determining the concentration of the at least one impurity component, and comparing the concentration so determined with a reference concentration for that component. When the value of the concentration so determined is less than or equal to the reference concentration, the first gas stream is utilized to provide the high purity gas product. When the value of the concentration so determined is greater than the reference concentration, a second gas stream comprising the major component is provided and the first and second gas streams are mixed to yield a mixed gas stream having a concentration of the at least one impurity component that is less than the reference concentration. The second gas stream is provided by dividing the first gas stream into a first substream and a second substream, removing at least a portion of the at least one impurity component in the first substream to provide a purified substream, and mixing the purified substream with the second substream to provide the high purity gas product. The mixed gas stream is utilized to provide the high purity gas product.
50 Citations
29 Claims
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1. A method for supplying a high purity gas product comprising
(a) providing a first gas stream comprising a major component and at least one impurity component; -
(b) determining the concentration of the at least one impurity component and comparing the concentration so determined with a reference concentration for that component; (c) when the value of the concentration so determined is less than or equal to the reference concentration, utilizing the first gas stream to provide the high purity gas product; and (d) when the value of the concentration so determined is greater than the reference concentration, (1) providing a second gas stream comprising the major component, wherein the second gas stream is provided by dividing the first gas stream into a first substream and a second substream, removing at least a portion of the at least one impurity component in the first substream to provide a purified substream, and mixing the purified substream with the second substream to provide the high purity gas product; and (2) mixing the first gas stream with the second gas stream to yield a mixed gas stream having a concentration of the at least one impurity component that is less than the reference concentration, and utilizing the mixed gas stream to provide the high purity gas product. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15)
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16. An apparatus for generating a high purity gas product comprising
(a) a first flow control valve and piping means adapted to provide a first gas stream comprising a major component and at least one impurity component; -
(b) a second control valve and piping means adapted to provide a second gas stream comprising the major component; (c) a mixing zone having a first inlet, a second inlet, and an outlet, wherein the first inlet is in gas flow communication with the first flow control valve and piping means and the second inlet is in gas flow communication with the second control valve and piping means, and wherein the mixing zone is adapted to mix the first and second gas streams and provide a mixed gas stream via the outlet; (d) an analysis zone having an inlet, an outlet, and at least one sensor adapted to measure the concentration of the at least one impurity component in the mixed gas stream and generate a first signal proportional to the concentration of the impurity component therein, wherein the inlet of the analysis zone is in gas flow communication with the outlet of the mixing zone and the outlet is adapted to provide the high purity gas product; (e) control means adapted to receive the first signal, compare the first signal with a first parameter proportional to the concentration of the at least one impurity in the first gas stream and a second parameter proportional to a maximum allowable concentration of the at least one impurity in the high purity gas product, generate a second signal and a third signal, and transmit the second and third signals to the first and second flow control valves, respectively, such that the flow rates of the first and second gas streams can be adjusted to yield a concentration of the at least one impurity in the high purity gas product equal to or less than the maximum allowable concentration; and (f) purifier means adapted for the removal of the at least one impurity from the first gas mixture, wherein the purifier means has an inlet and an outlet, piping means adapted to transfer a portion of the first gas mixture to the inlet of the purifier means, and piping means adapted to transfer a purified gas mixture from the outlet of the purifier to the second control valve. - View Dependent Claims (17, 18, 19, 20)
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21. A method for generating a high purity gas product comprising
(a) providing an apparatus comprising (1) a first flow control valve and piping means and adapted to provide a first gas stream comprising a major component and at least one impurity component; -
(2) a second control valve and piping means adapted to provide a second gas stream comprising the major component; (3) a mixing zone having a first inlet, a second inlet, and an outlet, wherein the first inlet is in gas flow communication with the first flow control valve and piping means and the second inlet is in gas flow communication with the second control valve and piping means, and wherein the mixing zone is adapted to mix the first and second gas streams and provide a mixed gas stream via the outlet; (4) an analysis zone having an inlet, an outlet, and at least one sensor adapted to measure the concentration of the at least one impurity component in the mixed gas stream and generate a first signal proportional to the concentration of the impurity component therein, wherein the inlet of the analysis zone is in gas flow communication with the outlet of the mixing zone and the outlet is adapted to provide the high purity gas product; and (5) control means adapted to receive the first signal, compare the first signal with a first parameter proportional to the concentration of the at least one impurity in the first gas stream and a second parameter proportional to a maximum allowable concentration of the at least one impurity in the high purity gas product, generate a second signal and a third signal, and transmit the second and third signals to the first and second flow control valves, respectively, wherein the first gas stream comprises a plurality of impurity components and the analysis zone comprises a plurality of sensors, and wherein each sensor is adapted to determine the concentration of a different impurity component; (b) providing the first gas stream comprising the major component and the at least one impurity component; (c) determining the concentration of the at least one impurity component, in the mixed gas stream, generating the first signal proportional to the concentration of the impurity component therein, and comparing the first signal so generated with the first and second parameters; (d) when the value of the first signal so determined is less than or equal to second parameter, generating the second and third signals which open the first control valve and close the second control valve, respectively, such that the first gas stream provides the high purity gas product; (e) when the value of the first signal so determined is greater than the second parameter, (1) generating the second and third signals, (2) providing the second gas stream comprising the major component, (3) utilizing the second and third signals to control the first and second flow control valves, respectively, such that the signal proportional to the concentration of the at least one impurity component in the mixed gas stream is less than the second parameter, and (4) utilizing the mixed gas stream to provide the high purity gas product; (f) providing purifier means adapted for the removal of the at least one impurity from the first gas mixture, wherein the purifier means has an inlet and an outlet, piping means adapted to transfer a portion of the first gas mixture to the inlet of the purifier means, and piping means adapted to transfer a purified gas mixture from the outlet of the purifier to the second control valve; and (g) removing at least a portion of the at least one impurity from the first gas mixture to provide the purified gas mixture and transferring the first gas mixture to the second control valve, wherein the purifier means comprises a system selected from the group consisting of permeation through a hydrogen-permeable membrane, pressure swing adsorption, thermal swing adsorption, and chemical reaction with a porous solid. - View Dependent Claims (22, 23)
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24. An apparatus for generating a high purity gas product comprising
(a) a proportional flow control and mixing valve having a first inlet adapted to accept a first gas stream comprising a major component and at least one impurity component, a second inlet adapted to accept a second gas stream comprising the major component, and an outlet adapted to supply a mixed gas stream; -
(b) an analysis zone having an inlet, an outlet, and at least one sensor adapted to measure the concentration of the at least one impurity component in the mixed gas stream and generate a first signal proportional to the concentration of the impurity component therein, wherein the inlet of the analysis zone is in gas flow communication with outlet of the proportional flow control and mixing valve and is adapted to provide the high purity gas product; and (c) control means adapted to receive the first signal, compare the first signal with a first parameter proportional to the concentration of the at least one impurity in the first gas stream and a second parameter proportional to a maximum allowable concentration of the at least one impurity in the high purity gas product, generate a second signal proportional to the ratio of the first and second parameters, and transmit the second signal to the proportional flow control and mixing valve such that the flow rates of the first and second gas streams can be adjusted to yield a concentration of the at least one impurity in the high purity gas product equal to or less than the maximum allowable concentration. - View Dependent Claims (25, 26, 27, 28)
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29. The apparatus of claim 34 wherein the purifier means comprises a system selected from the group consisting of permeation through a hydrogen-permeable membrane, pressure swing adsorption, thermal swing adsorption, and chemical reaction with a porous solid.
Specification