MEMS DEVICES HAVING IMPROVED UNIFORMITY AND METHODS FOR MAKING THEM
First Claim
1. A method of making an electromechanical device, comprising:
- forming a sacrificial layer over a substrate;
forming two or more substantially parallel first channels in the sacrificial layer to thereby form at least one strip of the sacrificial layer;
forming support rails in the formed first channels;
forming a first elongated opening in the strip of the sacrificial layer;
forming an elongated post in the first elongated opening;
forming a deformable layer over the sacrificial layer, the support rails and the elongated post;
forming one or more second channels in the deformable layer to thereby form at least one strip of the deformable layer, the strip of the deformable layer being substantially perpendicular to the strip of the sacrificial layer; and
removing the sacrificial layer to form a cavity between the strip of the deformable layer and the substrate, the cavity being bordered on two sides by the support rails;
wherein the support rails support the deformable layer on the two sides of the cavity;
wherein the elongated post is within the cavity; and
wherein the elongated post is aligned so that the elongate direction is substantially parallel to the support rails.
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Accused Products
Abstract
Disclosed is a microelectromechanical system (MEMS) device and method of manufacturing the same. In one aspect, MEMS such as an interferometric modulator include one or more elongated interior posts and support rails supporting a deformable reflective layer, where the elongated interior posts are entirely within an interferometric cavity and aligned parallel with the support rails. In another aspect, the interferometric modulator includes one or more elongated etch release holes formed in the deformable reflective layer and aligned parallel with channels formed in the deformable reflective layer defining parallel strips of the deformable reflective layer.
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Citations
37 Claims
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1. A method of making an electromechanical device, comprising:
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forming a sacrificial layer over a substrate; forming two or more substantially parallel first channels in the sacrificial layer to thereby form at least one strip of the sacrificial layer; forming support rails in the formed first channels; forming a first elongated opening in the strip of the sacrificial layer; forming an elongated post in the first elongated opening; forming a deformable layer over the sacrificial layer, the support rails and the elongated post; forming one or more second channels in the deformable layer to thereby form at least one strip of the deformable layer, the strip of the deformable layer being substantially perpendicular to the strip of the sacrificial layer; and removing the sacrificial layer to form a cavity between the strip of the deformable layer and the substrate, the cavity being bordered on two sides by the support rails; wherein the support rails support the deformable layer on the two sides of the cavity;
wherein the elongated post is within the cavity; and
wherein the elongated post is aligned so that the elongate direction is substantially parallel to the support rails. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A method of making an electromechanical device, comprising:
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forming a sacrificial layer over a substrate; forming two or more substantially parallel first channels in the sacrificial layer to thereby form at least one strip of the sacrificial layer; forming support rails in the formed first channels; forming a deformable layer over the sacrificial layer and over the support rails; forming one or more second channels in the deformable layer to thereby form at least one strip of the deformable layer, the strip of the deformable layer being substantially perpendicular to the strip of the sacrificial layer; forming one or more first elongated openings in the strip of the deformable layer, wherein the elongate direction of the first elongated opening is substantially parallel to the strip of the deformable layer; and removing the sacrificial layer to form a cavity between the strip of the deformable layer and the substrate, the cavity being bordered on two sides by the support rails. - View Dependent Claims (9)
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10. An electromechanical device, comprising:
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a substrate; a plurality of deformable membranes; a plurality of support structures arranged over the substrate and configured to support the deformable membranes; and a plurality of cavities defined by the substrate, the support structures, and the deformable membranes; wherein the plurality of support structures comprise support rails aligned in a first direction separating the plurality of cavities into one or more rows, and at least one elongated support post located between the support rails and located entirely within one of the cavities, and further wherein the elongated support post is aligned so that the elongate direction is substantially parallel to the support rails. - View Dependent Claims (11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22)
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23. An electromechanical device, comprising:
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a substrate; two or more electrically conductive row electrodes formed on the substrate; a plurality of support rails formed on the substrate and configured to separate the two or more row electrodes; two or more deformable column electrodes supported by the plurality of support rails, the column electrodes being substantially perpendicular to the row electrodes; a plurality of elongated openings formed in the deformable column electrodes, where the elongated openings are aligned such that the elongate direction is substantially parallel to the column electrodes; and an array of cavities defined by the row electrodes, the support rails, and the deformable column electrodes; wherein at least one elongated opening is at least partially located in each of the cavities. - View Dependent Claims (24, 25, 26, 27, 28)
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29. An interferometric modulator comprising:
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means for transmitting light; means for reflecting light, the reflecting means being movable towards or away from the transmitting means; and means for supporting the reflecting means and for improving uniformity of a stress state of the reflecting means. - View Dependent Claims (30, 31, 32)
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33. An interferometric modulator comprising:
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means for transmitting light; means for reflecting light, the reflecting means being movable towards or away from the transmitting means; means for supporting the reflecting means; and means for venting an etch gas from a cavity between the reflecting means and the transmitting means and for improving uniformity of a stress state of the reflecting means. - View Dependent Claims (34, 35, 36, 37)
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Specification