Semiconductor Device and Fabrication Method Thereof
First Claim
1. An EL display device comprising:
- a plurality of pixels over a substrate, each of the plurality of pixels comprising;
a switching TFT comprising a first channel formation region, a first source region and a first drain region over the substrate, a gate insulating film over the first channel formation region, the first source region and the first drain region, and a first gate electrode over the gate insulating film;
a current controlling TFT comprising a second channel formation region, a second source region and a second drain region over the substrate, the gate insulating film over the second channel formation region, the second source region and the second drain region, and a second gate electrode over the gate insulating film;
a first insulating film over the switching TFT and the current controlling TFT;
a source wiring over the first insulating film and being connected to one of the first source region and the first drain region of the switching TFT;
a first drain wiring over the first insulating film and being connected to the other of the first source region and the first drain region of the switching TFT and the second gate electrode of the current controlling TFT;
a second drain wiring over the first insulating film and being connected to one of the second source region and the second drain region of the current controlling TFT;
a current supply line over the first insulating film and being connected to the other of the second source region and the second drain region of the current controlling TFT;
a second insulting film over the source wiring, the first drain wiring, the second drain wiring and the current supply line;
a first electrode over the second insulating film and being connected to the second drain wiring;
an EL layer over the first electrode;
a second electrode over the EL layer; and
a holding capacitance comprising a semiconductor layer, the gate insulating film and the second gate electrode of the current controlling TFT,wherein the holding capacitance is overlapped with the current supply line.
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Abstract
This invention provides a semiconductor device having high operation performance and high reliability. An LDD region 707 overlapping with a gate wiring is arranged in an n-channel TFT 802 forming a driving circuit, and a TFT structure highly resistant to hot carrier injection is achieved. LDD regions 717, 718, 719 and 720 not overlapping with a gate wiring are arranged in an n-channel TFT 804 forming a pixel unit. As a result, a TFT structure having a small OFF current value is achieved. In this instance, an element belonging to the Group 15 of the Periodic Table exists in a higher concentration in the LDD region 707 than in the LDD regions 717, 718, 719 and 720.
109 Citations
26 Claims
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1. An EL display device comprising:
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a plurality of pixels over a substrate, each of the plurality of pixels comprising; a switching TFT comprising a first channel formation region, a first source region and a first drain region over the substrate, a gate insulating film over the first channel formation region, the first source region and the first drain region, and a first gate electrode over the gate insulating film; a current controlling TFT comprising a second channel formation region, a second source region and a second drain region over the substrate, the gate insulating film over the second channel formation region, the second source region and the second drain region, and a second gate electrode over the gate insulating film; a first insulating film over the switching TFT and the current controlling TFT; a source wiring over the first insulating film and being connected to one of the first source region and the first drain region of the switching TFT; a first drain wiring over the first insulating film and being connected to the other of the first source region and the first drain region of the switching TFT and the second gate electrode of the current controlling TFT; a second drain wiring over the first insulating film and being connected to one of the second source region and the second drain region of the current controlling TFT; a current supply line over the first insulating film and being connected to the other of the second source region and the second drain region of the current controlling TFT; a second insulting film over the source wiring, the first drain wiring, the second drain wiring and the current supply line; a first electrode over the second insulating film and being connected to the second drain wiring; an EL layer over the first electrode; a second electrode over the EL layer; and a holding capacitance comprising a semiconductor layer, the gate insulating film and the second gate electrode of the current controlling TFT, wherein the holding capacitance is overlapped with the current supply line. - View Dependent Claims (5, 9, 13, 17, 21, 23)
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2. An EL display device comprising:
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a plurality of pixels over a substrate, each of the plurality of pixels comprising; a switching TFT comprising a first semiconductor layer over the substrate, a gate insulating film over the first semiconductor layer, and a first gate electrode over the gate insulating film; a current controlling TFT comprising a second semiconductor layer over the substrate, the gate insulating film over the second semiconductor layer, and a second gate electrode over the gate insulating film; a first insulating film over the switching TFT and the current controlling TFT; a source wiring over the first insulating film and being connected to the first semiconductor layer of the switching TFT; a first drain wiring over the first insulating film and being connected to the first semiconductor layer of the switching TFT and the second gate electrode of the current controlling TFT; a second drain wiring over the first insulating film and being connected to one of the second semiconductor layer of the current controlling TFT; a current supply line over the first insulating film and being connected to the second semiconductor layer of the current controlling TFT; a second insulating film over the source wiring, the first drain wiring, the second drain wiring and the current supply line; a first electrode over the second insulating film and being connected to the second drain wiring; an EL layer over the first electrode; a second electrode over the EL layer; and a holding capacitance provided between the second gate electrode of the current controlling TFT and the current supply line, wherein the holding capacitance is overlapped with the current supply line. - View Dependent Claims (6, 10, 14, 18, 24)
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3. An EL display device comprising:
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a plurality of pixels over a substrate, each of the plurality of pixels comprising; a switching TFT comprising first, second and third channel formation regions, a first source region and a first drain region over the substrate, a gate insulating film over the first, second and third channel formation regions, the first source region and the first drain region, and a first gate electrode over the gate insulating film; a current controlling TFT comprising fourth, fifth and sixth channel formation regions, a second source region and a second drain region over the substrate, the gate insulating film over the fourth, fifth and sixth channel formation regions, the second source region and the second drain region, and a second gate electrode over the gate insulating film; a first insulating film over the switching TFT and the current controlling TFT; a source wiring over the first insulating film and being connected to the one of the first source region and the first drain region of the switching TFT; a first drain wiring over the first insulating film and being connected to the other of the first source region and the first drain region of the switching TFT and the second gate electrode of the current controlling TFT; a second drain wiring over the first insulating film and being connected to one of the second source region and the second drain region of the current controlling TFT; a current supply line over the first insulating film and being connected to the other of the second source region and the second drain region of the current controlling TFT; a second insulting film over the source wiring, the first drain wiring, the second drain wiring and the current supply line; a first electrode over the second insulating film and being connected to the second drain wiring; an EL layer over the first electrode; a second electrode over the EL layer; and a holding capacitance comprising a semiconductor layer, the gate insulating film and the second gate electrode of the current controlling TFT, wherein the holding capacitance is overlapped with the current supply line. - View Dependent Claims (7, 11, 15, 19, 22, 25)
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4. An EL display device comprising:
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a plurality of pixels over a substrate, each of the plurality of pixels comprising; a switching TFT comprising a first semiconductor layer over the substrate, a gate insulating film over the first semiconductor layer, and a first gate electrode having a triple-gate structure over the gate insulating film; a current controlling TFT comprising a second semiconductor layer over the substrate, the gate insulating film over the second semiconductor layer, and a second gate electrode having a triple-gate structure over the gate insulating film; a first insulating film over the switching TFT and the current controlling TFT; a source wiring over the first insulating film and being connected to the first semiconductor layer of the switching TFT; a first drain wiring over the first insulating film and being connected to the first semiconductor layer of the switching TFT and the second gate electrode of the current controlling TFT; a second drain wiring over the first insulating film and being connected to one of the second semiconductor layer of current controlling TFT; a current supply line over the first insulating film and being connected to the second semiconductor layer of the current controlling TFT; a second insulting film over the source wiring, the first drain wiring, the second drain wiring and the current supply line; a first electrode over the second insulating film and being connected to the second drain wiring; an EL layer over the first electrode; a second electrode over the EL layer; and a holding capacitance provided between the second gate electrode of the current controlling TFT and the current supply line, wherein the holding capacitance is overlapped with the current supply line. - View Dependent Claims (8, 12, 16, 20, 26)
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Specification