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Semiconductor Device and Fabrication Method Thereof

  • US 20090014724A1
  • Filed: 09/09/2008
  • Published: 01/15/2009
  • Est. Priority Date: 02/23/1999
  • Status: Active Grant
First Claim
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1. An EL display device comprising:

  • a plurality of pixels over a substrate, each of the plurality of pixels comprising;

    a switching TFT comprising a first channel formation region, a first source region and a first drain region over the substrate, a gate insulating film over the first channel formation region, the first source region and the first drain region, and a first gate electrode over the gate insulating film;

    a current controlling TFT comprising a second channel formation region, a second source region and a second drain region over the substrate, the gate insulating film over the second channel formation region, the second source region and the second drain region, and a second gate electrode over the gate insulating film;

    a first insulating film over the switching TFT and the current controlling TFT;

    a source wiring over the first insulating film and being connected to one of the first source region and the first drain region of the switching TFT;

    a first drain wiring over the first insulating film and being connected to the other of the first source region and the first drain region of the switching TFT and the second gate electrode of the current controlling TFT;

    a second drain wiring over the first insulating film and being connected to one of the second source region and the second drain region of the current controlling TFT;

    a current supply line over the first insulating film and being connected to the other of the second source region and the second drain region of the current controlling TFT;

    a second insulting film over the source wiring, the first drain wiring, the second drain wiring and the current supply line;

    a first electrode over the second insulating film and being connected to the second drain wiring;

    an EL layer over the first electrode;

    a second electrode over the EL layer; and

    a holding capacitance comprising a semiconductor layer, the gate insulating film and the second gate electrode of the current controlling TFT,wherein the holding capacitance is overlapped with the current supply line.

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