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DEVICE AND METHOD FOR COMPENSATING A CAPACITIVE SENSOR MEASUREMENT FOR VARIATIONS CAUSED BY ENVIRONMENTAL CONDITIONS IN A SEMICONDUCTOR PROCESSING ENVIRONMENT

  • US 20090015268A1
  • Filed: 07/09/2008
  • Published: 01/15/2009
  • Est. Priority Date: 07/13/2007
  • Status: Abandoned Application
First Claim
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1. A method of sensing proximity to a showerhead in a semiconductor-processing system, the method comprising:

  • providing a first sensing capacitive plate that is operably supported by a substrate support pedestal;

    providing a second sensing capacitive plate that forms a sensing capacitor with the first sensing capacitive plate, wherein the sensing capacitor has a capacitance that varies with distance between the substrate support pedestal and the showerhead and also varies with at least one external factor;

    providing first and second reference capacitive plates to form a reference capacitor having a reference capacitance that does not vary with distance between the substrate support pedestal and the showerhead, but does vary with the at least one external factor;

    measuring the capacitance of the sensing capacitor;

    measuring the capacitance of the reference capacitor;

    providing an output relative to the proximity of the showerhead based upon the capacitance of the sensing and reference capacitances.

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