METHOD FOR DEPOSITION OF AN ANTI-SCRATCH COATING
First Claim
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1. :
- A process for the vacuum deposition of at least one boron-based thin film on a substrate, comprising;
at least one sputtering species that is chemically inactive or active with respect to boron is chosen;
a collimated beam of ions comprising predominantly said sputtering species is generated using at least one linear ion source positioned within an installation of industrial size;
said beam is directed onto at least one boron-based target; and
at least one surface portion of said substrate facing said target is positioned in such a way that a material sputtered by the ion bombardment of the target or a material resulting from a reaction of said sputtered material with at least one of the sputtering species is deposited on said surface portion.
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Abstract
Process for the vacuum deposition of at least one boron-based thin film on a substrate, characterized in that:
- at least one sputtering species that is chemically inactive or active with respect to boron is chosen;
- a collimated beam of ions comprising predominantly said sputtering species is generated using at least one linear ion source positioned within an installation of industrial size;
- said beam is directed onto at least one boron-based target; and
- at least one surface portion of said substrate facing said target is positioned in such a way that said material sputtered by the ion bombardment of the target or a material resulting from the reaction of said sputtered material with at least one of the sputtering species is deposited on said surface portion.
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Citations
19 Claims
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1. :
- A process for the vacuum deposition of at least one boron-based thin film on a substrate, comprising;
at least one sputtering species that is chemically inactive or active with respect to boron is chosen; a collimated beam of ions comprising predominantly said sputtering species is generated using at least one linear ion source positioned within an installation of industrial size; said beam is directed onto at least one boron-based target; and at least one surface portion of said substrate facing said target is positioned in such a way that a material sputtered by the ion bombardment of the target or a material resulting from a reaction of said sputtered material with at least one of the sputtering species is deposited on said surface portion. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19)
- A process for the vacuum deposition of at least one boron-based thin film on a substrate, comprising;
Specification