×

METHOD FOR DEPOSITION OF AN ANTI-SCRATCH COATING

  • US 20090017314A1
  • Filed: 07/26/2006
  • Published: 01/15/2009
  • Est. Priority Date: 08/01/2005
  • Status: Abandoned Application
First Claim
Patent Images

1. :

  • A process for the vacuum deposition of at least one boron-based thin film on a substrate, comprising;

    at least one sputtering species that is chemically inactive or active with respect to boron is chosen;

    a collimated beam of ions comprising predominantly said sputtering species is generated using at least one linear ion source positioned within an installation of industrial size;

    said beam is directed onto at least one boron-based target; and

    at least one surface portion of said substrate facing said target is positioned in such a way that a material sputtered by the ion bombardment of the target or a material resulting from a reaction of said sputtered material with at least one of the sputtering species is deposited on said surface portion.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×