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SELF-ALIGNED PILLAR PATTERNING USING MULTIPLE SPACER MASKS

  • US 20090017631A1
  • Filed: 05/13/2008
  • Published: 01/15/2009
  • Est. Priority Date: 06/01/2007
  • Status: Abandoned Application
First Claim
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1. A method for fabricating a semiconductor mask, comprising:

  • providing the image of a series of lines from a first spacer mask to a mask stack to form a patterned mask stack; and

    providing the image of a series of lines from a second spacer mask to said patterned mask stack to form a pillar mask comprised of a series of pillars, wherein the image of said series of lines from said second spacer mask is non-parallel with the image of said series of lines from said first spacer mask.

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