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Method of lifting off and fabricating array substrate for liquid crystal display device using the same

  • US 20090021687A1
  • Filed: 07/18/2008
  • Published: 01/22/2009
  • Est. Priority Date: 07/20/2007
  • Status: Active Grant
First Claim
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1. A method of lifting off, comprising:

  • forming a first material layer on a substrate;

    forming a photoresist pattern including first and second holes and on the first material layer;

    patterning the first material layer by using the photoresist pattern as a patterning mask to form a material pattern having first and second grooves within the material pattern, the first and second grooves corresponding to the first and second holes, respectively;

    forming a second material layer on an entire surface of the substrate including the photoresist pattern and the first and second grooves; and

    removing the photoresist pattern and the second material layer on the photoresist pattern at the same time,wherein a portion of the material pattern between the first and second grooves and portions of the material pattern at sides of the first and second grooves constitute a line as a whole.

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