OPTICAL INTEGRATOR FOR AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

• US 20090021839A1
• Filed: 08/05/2008
• Published: 01/22/2009
• Est. Priority Date: 02/17/2006
• Status: Active Grant

• Current Assignee: CARL Zeiss SMT GmbH (Carl-Zeiss-Stiftung)
• Original Assignee: Carl Zeiss AG (Carl-Zeiss-Stiftung)
• Inventors: Haverkamp, Nils, Siekmann, Heiko, Kalchbrenner, Eva, Gerhard, Michael, Rennon, Siegfried, Wolf, Oliver, Bresan, Andre, Burkart, Stefan, Layh, Michael, Wangler, Johannes, Scharnweber, Ralf, Scholz, Axel
• Granted Patent: US 7,880,969 B2
• Time in Patent Office: Days
• US Class Current: 359/621
• CPC Class Codes: G03F 7/70075 Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
• CPC Class Codes: G03F 7/70958 Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
• CPC Class Codes: Y10T 83/0304 Grooving
• CPC Class Codes: Y10T 83/04 Processes

Abstract

The disclosure relates to an optical integrator configured to produce a plurality of secondary light sources in an illumination system of a microlithographic projection exposure apparatus. The disclosure also relates to a method of manufacturing an array of elongated microlenses for use in such an illumination system. Arrays of elongated microlenses are often contained in optical integrators or scattering plates of such illumination systems.

Claims

1. An optical integrator, comprising:

a) a first array of elongated convexly curved first microlenses that are arranged side by side in a first plane and have first vertex lines; and

b) a second array of elongated convexly curved second microlenses that are arranged side by side in a second plane and have second vertex lines,

wherein;

at least one second vertex line or a portion thereof does not coincide, in a projection along an optical axis of the optical integrator, with any one of the first vertex lines or portions thereof, and

the optical integrator is configured to produce a plurality of secondary light sources in an illumination system of a microlithographic projection exposure apparatus.

2. The optical integrator of claim 1, wherein the at least one second vertex line or a portion thereof forms a zigzag line.

3. The optical integrator of claim 2, wherein adjacent straight portions of the at least one second vertex line or a portion thereof are inclined by an angle with respect to a reference direction.

4. The optical integrator of claim 1, wherein the at least one second vertex line or a portion thereof forms a serpentine line.

5. The optical integrator of claim 1, wherein the first microlenses have longitudinal axes extending parallel to a first longitudinal direction which is at least substantially parallel to longitudinal axes of the second microlenses.

6. The optical integrator of claim 1, wherein the second microlenses have varying pitches.

7. The optical integrator of claim 6, wherein the first vertex lines and the second vertex lines are straight.

8. The optical integrator of claim 6, wherein the second microlenses have identical surface profiles.

9. The optical integrator of claim 1, wherein there is a one to one correspondence between the first microlenses and the second microlenses.

10. The optical integrator of claim 1, wherein a focal plane of the second microlenses at least substantially coincides with the first plane.

11. The optical integrator of claim 1, wherein the first microlenses and the second microlenses have pitches of less than 5 mm.

12. The optical integrator of claim 1, wherein the first microlenses and the second microlenses have pitches of less than 2 mm.

13. A system, comprising:

an optical integrator according to claim 1,

wherein the system is an illumination system of a microlithographic projection exposure apparatus.

14. The system of claim 13, further comprising at least one scattering structure that includes a plurality of microlenses arranged in front of or behind the secondary light sources.

15. The illumination system of claim 14, wherein the microlenses of the optical integrator and the microlenses of the scattering structure are configured such that microlenses illuminated with identical irradiance distributions are separated by more than 5 mm.

16. An optical integrator, comprising:

a) a first array of elongated first microlenses that are arranged side by side in a first plane and have first vertex lines; and

b) a second array of elongated second microlenses that are arranged side by side in a second plane and have second vertex lines,

wherein at least one second vertex line forms a zigzag or serpentine line, and the optical integrator is configured to produce a plurality of secondary light sources in an illumination system of a microlithographic projection exposure apparatus.

17. An optical integrator, comprising:

a) a first array of elongated first microlenses that are arranged side by side in a first plane; and

b) a second array of elongated second microlenses that are arranged side by side in a second plane,

wherein at least one second microlens has a curved surface profile which varies along a longitudinal axis of the at least one second microlens, and the optical integrator is configured to produce a plurality of secondary light sources in an illumination system of a microlithographic projection exposure apparatus.

18. The optical integrator of claim 17, wherein a plurality of adjacent second microlenses have curved surface profiles which vary along longitudinal axes of the plurality of second microlenses.

19. The optical integrator of claim 18, wherein the second array of second microlenses comprises:

a) at least one first area in which the second microlenses have first curved surface profiles; and

b) at least one second area in which the second microlenses have second curved surface profiles that differ from the first curved surface profiles in that material has been locally removed.

20. The optical integrator of claim 19, wherein at least two second areas are arranged along a first direction and at least two further second areas are arranged along a second direction which is at least substantially perpendicular to the first direction, and wherein the second microlenses in the at least two second areas arranged along the first direction have curved surface profiles that are different from the curved surface profiles of the at least two second microlenses in the further second areas arranged along the second direction.