COMPUTER-IMPLEMENTED METHODS, SYSTEMS, AND COMPUTER-READABLE MEDIA FOR DETERMINING A MODEL FOR PREDICTING PRINTABILITY OF RETICLE FEATURES ON A WAFER
First Claim
1. A computer-implemented method for determining a model for predicting printability of reticle features on a wafer, comprising:
- generating simulated images of the reticle features printed on the wafer using different generated models for a set of different values of exposure conditions;
determining one or more characteristics of the reticle features of the simulated images;
comparing the one or more characteristics of the reticle features of the simulated images to one or more characteristics of the reticle features printed on the wafer using a lithography process; and
selecting one of the different generated models as the model to be used for predicting the printability of the reticle features based on results of the comparing step.
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Abstract
Computer-implemented methods, systems, and computer-readable media for determining a model for predicting printability of reticle features on a wafer are provided. One method includes generating simulated images of the reticle features printed on the wafer using different generated models for a set of different values of exposure conditions. The method also includes determining one or more characteristics of the reticle features of the simulated images. In addition, the method includes comparing the one or more characteristics of the reticle features of the simulated images to one or more characteristics of the reticle features printed on the wafer using a lithography process. The method further includes selecting one of the different generated models as the model to be used for predicting the printability of the reticle features based on results of the comparing step.
148 Citations
20 Claims
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1. A computer-implemented method for determining a model for predicting printability of reticle features on a wafer, comprising:
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generating simulated images of the reticle features printed on the wafer using different generated models for a set of different values of exposure conditions; determining one or more characteristics of the reticle features of the simulated images; comparing the one or more characteristics of the reticle features of the simulated images to one or more characteristics of the reticle features printed on the wafer using a lithography process; and selecting one of the different generated models as the model to be used for predicting the printability of the reticle features based on results of the comparing step. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18)
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19. A system configured to determine a model for predicting printability of reticle features on a wafer, comprising:
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a simulation engine configured to generate simulated images of the reticle features printed on the wafer using different generated models for a set of different values of exposure conditions; and a computer system configured to; determine one or more characteristics of the reticle features of the simulated images; compare the one or more characteristics of the reticle features of the simulated images to one or more characteristics of the reticle features printed on the wafer using a lithography process; and select one of the different generated models as the model to be used for predicting the printability of the reticle features based on results of the comparison.
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20. A computer-readable medium, comprising program instructions executable on a computer system for performing a computer-implemented method for determining a model for predicting printability of reticle features on a wafer, wherein the computer-implemented method comprises:
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generating simulated images of the reticle features printed on the wafer using different generated models for a set of different values of exposure conditions; determining one or more characteristics of the reticle features of the simulated images; comparing the one or more characteristics of the reticle features of the simulated images to one or more characteristics of the reticle features printed on the wafer using a lithography process; and
selecting one of the different generated models as the model to be used forpredicting the printability of the reticle features based on results of the comparing step.
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Specification