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COMPUTER-IMPLEMENTED METHODS, SYSTEMS, AND COMPUTER-READABLE MEDIA FOR DETERMINING A MODEL FOR PREDICTING PRINTABILITY OF RETICLE FEATURES ON A WAFER

  • US 20090024967A1
  • Filed: 05/06/2008
  • Published: 01/22/2009
  • Est. Priority Date: 05/07/2007
  • Status: Active Grant
First Claim
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1. A computer-implemented method for determining a model for predicting printability of reticle features on a wafer, comprising:

  • generating simulated images of the reticle features printed on the wafer using different generated models for a set of different values of exposure conditions;

    determining one or more characteristics of the reticle features of the simulated images;

    comparing the one or more characteristics of the reticle features of the simulated images to one or more characteristics of the reticle features printed on the wafer using a lithography process; and

    selecting one of the different generated models as the model to be used for predicting the printability of the reticle features based on results of the comparing step.

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