Substrate Cleaning Device And Substrate Processing Apparatus Including The Same

• US 20090025155A1
• Filed: 07/24/2008
• Published: 01/29/2009
• Est. Priority Date: 07/26/2007
• Status: Active Grant

• Current Assignee: Screen Semiconductor Solutions Co., Ltd. (SCREEN Holdings Co., Ltd.)
• Original Assignee: SOKUDO Co., Ltd. (SCREEN Holdings Co., Ltd.)
• Inventors: Nishiyama, Koji, Yoshii, Hiroshi, Nishimura, Joichi
• Granted Patent: US 8,286,293 B2
• Time in Patent Office: Days
• US Class Current: 15/21.100
• CPC Class Codes: H01L 21/67046 using mainly scrubbing means, e.g. brushes

Abstract

A cleaning processing unit includes a spin chuck for horizontally holding a substrate and rotating the substrate around the vertical axis passing through the center of the substrate. A bevel cleaner is disposed outside the spin chuck. The bevel cleaner includes a cleaning brush. The cleaning brush has a shape that is symmetric about its vertical axis, and has an upper bevel cleaning surface, an end surface cleaning surface, and a lower bevel cleaning surface. The end surface cleaning surface is a cylindrical surface having its axis in the vertical direction. The upper bevel cleaning surface extends out from and is inclined upward from the upper end of the end surface cleaning surface, and the lower bevel cleaning surface extends out from and is inclined downward from the lower end of the end surface cleaning surface.

Claims

1. A substrate processing apparatus disposed adjacent to an exposure device, the substrate processing apparatus comprising:

a processing section for subjecting a substrate to processing, the substrate having one surface and another surface opposing the one surface;

an interface provided adjacent to one end of the processing section for receiving and transferring the substrate between the processing section and the exposure device, wherein at least one of the processing section or the interface comprises a substrate cleaning device that cleans the substrate before exposure processing,

the substrate cleaning device comprising;

a substrate rotation holding device that rotates the substrate while holding the substrate;

an end portion cleaning brush configured to come into contact with an end portion of the substrate held in the substrate rotation holding device; and

a brush rotating mechanism that rotates the end portion cleaning brush around a rotating shaft in a direction substantially perpendicular to the one surface of the substrate held in the substrate rotation holding device,

the end portion cleaning brush comprising;

a tapered first cleaning surface configured to come into contact with a bevel region on a side of the one surface of the substrate held by the substrate rotation holding device;

a cylindrical second cleaning surface configured to come into contact with an end surface region of the substrate held by the substrate rotation holding device; and

a tapered third cleaning surface configured to come into contact with a bevel region on a side of the another surface of the substrate held by the substrate rotation holding device, wherein the first, second, and third cleaning surfaces are integrally provided with the rotating shaft as its center.

2. The substrate processing apparatus according to claim 1 wherein:

the end portion cleaning brush further comprises an annular plane-shaped fourth cleaning surface configured to come into contact with a peripheral portion of the another surface of the substrate held by the substrate rotation holding device,

the fourth cleaning surface being provided integrally with the first, second, and third cleaning surfaces with the rotating shaft as its center.

3. The substrate processing apparatus according to claim 1 wherein:

at least one of the processing section or the interface includes a reversing device that reverses the one surface and the another surface of the substrate; and

the substrate cleaning device further includes a surface cleaning brush that is provided integrally with the end portion cleaning brush and configured to come into contact with the another surface of the substrate held in the substrate rotation holding device after the reverse by the reversing device.

4. The substrate processing apparatus according to claim 1 wherein:

the substrate cleaning device further includes a first cleaning liquid supplier that supplies a cleaning liquid onto the top surface of the substrate held by the substrate rotation holding device.

5. The substrate processing apparatus according to claim 1 wherein:

the substrate cleaning device further includes a second cleaning liquid supplier that supplies a cleaning liquid onto the back surface of the substrate held by the substrate rotation holding device.

6. A substrate processing apparatus disposed adjacent to an exposure device, the substrate processing apparatus comprising:

a processing section for subjecting a substrate to processing; and

an interface provided adjacent to one end of the processing section for receiving and transferring the substrate between the processing section and the exposure device,

wherein at least one of the processing section or the interface comprises a substrate cleaning device that cleans the substrate before exposure processing,

wherein the substrate cleaning device includes;

a substrate rotation holding device that rotates the substrate while holding the substrate;

an end portion cleaning brush disposed to come into contact with an end portion of the substrate held in the substrate rotation holding device;

a brush rotating mechanism that rotates the end portion cleaning brush around a rotating shaft in a direction inclined to one surface of the substrate held in the substrate rotation holding device,

wherein the end portion cleaning brush includes;

a tapered first cleaning surface that can come into contact with an end surface region of the substrate held by the substrate rotation holding device;

a cylindrical second cleaning surface configured to come into contact with a bevel region on a side of the one surface of the substrate held by the substrate rotation holding device; and

a tapered third cleaning surface configured to come into contact with a peripheral portion of the one surface of the substrate held by the substrate rotation holding device, wherein the first, second, and third cleaning surfaces are integrally joined as a single structure with the rotating shaft as its center.

7. The substrate processing apparatus according to claim 6 wherein:

the substrate cleaning device further includes a first cleaning liquid supplier that supplies a cleaning liquid onto the top surface of the substrate held by the substrate rotation holding device.

8. The substrate processing apparatus according to claim 6 wherein:

the substrate cleaning device further includes a second cleaning liquid supplier that supplies a cleaning liquid onto the back surface of the substrate held by the substrate rotation holding device.

9. A substrate processing apparatus arranged adjacent to an exposure device, the substrate processing apparatus comprising:

a processing section for subjecting a substrate to processing, the substrate having one surface, another surface opposing the one surface, and an end portion; and

an interface provided adjacent to one end of the processing section for receiving and transferring the substrate between the processing section and the exposure device,

wherein at least one of the processing section or the interface comprises a substrate cleaning device that cleans the substrate before exposure processing,

the substrate cleaning device including;

a substrate rotation holding device that rotates the substrate while holding the substrate,

first and second cleaning brushes disposed to come into contact with the end portion of the substrate held in the substrate rotation holding device,

first and second brush rotating mechanisms that respectively rotate the first and second cleaning brushes around a rotating shaft in a direction substantially perpendicular to one surface of the substrate held in the substrate rotation holding device, wherein

the first cleaning brush has a tapered first cleaning surface configured to come into contact with a bevel region on a side of the one surface of the substrate held by the substrate rotation holding device, and

the second cleaning brush has a tapered second cleaning surface configured to come into contact with a bevel region on a side of the another surface of the substrate held by the substrate rotation holding device.

10. The substrate processing apparatus according to claim 9 wherein:

at least one of the first or second cleaning brushes further comprises a cylindrical third cleaning surface configured to come into contact with an end surface region of the substrate held by the substrate rotation holding device, wherein the third cleaning surface is provided integrally with the first or second cleaning surface with the rotating shaft as its center.

11. The substrate processing apparatus according to claim 9 wherein:

the substrate cleaning device further includes a first cleaning liquid supplier that supplies a cleaning liquid onto the top surface of the substrate held by the substrate rotation holding device.

12. The substrate processing apparatus according to claim 9 wherein:

the substrate cleaning device further includes a second cleaning liquid supplier that supplies a cleaning liquid onto the back surface of the substrate held by the substrate rotation holding device.

13. A substrate cleaning device comprising:

a substrate rotation holding device that rotates a substrate while holding the substrate;

a cleaning brush disposed to come into contact with an end portion of the substrate held in the substrate rotation holding device; and

a brush rotating mechanism that rotates the cleaning brush around a rotating shaft in a direction substantially perpendicular to one surface of the substrate held in the substrate rotation holding device,

wherein the cleaning brush includes;

a tapered first cleaning surface configured to come into contact with a bevel region on a side of a top surface of the substrate held by the substrate rotation holding device,

a cylindrical second cleaning surface configured to come into contact with an end surface region of the substrate held by the substrate rotation holding device,

a tapered third cleaning surface configured to come into contact with a bevel region on a side of a back surface of the substrate held by the substrate rotation holding device, and

an annular plane-shaped fourth cleaning surface configured to come into contact with a peripheral portion of the back surface of the substrate held by the substrate rotation holding device, wherein the first, second, third, and fourth cleaning surfaces are integrally provided with the rotating shaft as its center.

14. The substrate cleaning device according to claim 13, further comprising a first cleaning liquid supplier that supplies a cleaning liquid onto the top surface of the substrate held by the substrate rotation holding device.

15. The substrate cleaning device according to claim 13, further comprising a second cleaning liquid supplier that supplies a cleaning liquid onto the back surface of the substrate held by the substrate rotation holding device.

16. A substrate cleaning device comprising:

a substrate rotation holding device that rotates a substrate while holding the substrate;

an end portion cleaning brush disposed to come into contact with an end portion of the substrate held in the substrate rotation holding device;

a surface cleaning brush that is provided integrally with the end portion cleaning brush and is configured to come into contact with one surface of the substrate held in the substrate rotation holding device; and

a brush rotating mechanism that rotates the end portion cleaning brush around a rotating shaft in a direction substantially perpendicular to a top surface of the substrate held in the substrate rotation holding device,

wherein the end portion cleaning brush includes;

a tapered first cleaning surface configured to come into contact with a bevel region on a side of one surface of the substrate held by the substrate rotation holding device,

a cylindrical second cleaning surface configured to come into contact with an end surface region of the substrate held by the substrate rotation holding device, and

a tapered third cleaning surface configured to come into contact with a bevel region on a side of another surface of the substrate held by the substrate rotation holding device, wherein the first, second, and third cleaning surfaces are integrally provided with the rotating shaft as its center.

17. The substrate cleaning device according to claim 16, further comprising a first cleaning liquid supplier that supplies a cleaning liquid onto the one surface of the substrate held by the substrate rotation holding device.

18. The substrate cleaning device according to claim 16, further comprising a second cleaning liquid supplier that supplies a cleaning liquid to the another surface of the substrate held by the substrate rotation holding device.

19. A substrate cleaning device comprising:

a substrate rotation holding device that rotates a substrate while holding the substrate;

an end portion cleaning brush disposed to come into contact with an end portion of the substrate held in the substrate rotation holding device; and

a brush rotating mechanism that rotates the end portion cleaning brush around a rotating shaft in a direction inclined to one surface of the substrate held in the substrate rotation holding device,

wherein the end portion cleaning brush includes;

a tapered first cleaning surface configured to come into contact with an end surface region of the substrate held by the substrate rotation holding device,

a cylindrical second cleaning surface configured to come into contact with a bevel region on a side of the one surface of the substrate held by the substrate rotation holding device, and

a tapered third cleaning surface configured to come into contact with a peripheral portion of the one surface of the substrate held by the substrate rotation holding device, wherein the first, second, and third cleaning surfaces are integrally provided with the rotating shaft as its center.

20. The substrate cleaning device according to claim 19, further comprising a first cleaning liquid supplier that supplies a cleaning liquid onto the one surface of the substrate held by the substrate rotation holding device.

21. The substrate cleaning device according to claim 19, further comprising a second cleaning liquid supplier that supplies a cleaning liquid to the another surface of the substrate held by the substrate rotation holding device.

22. A substrate cleaning device comprising:

a substrate rotation holding device that rotates a substrate while holding the substrate;

first and second cleaning brushes disposed to come into contact with an end portion of the substrate held in the substrate rotation holding device; and

first and second brush rotating mechanisms that respectively rotate the first and second cleaning brushes around a rotating shaft in a direction substantially perpendicular to one surface of the substrate held in the substrate rotation holding device,

wherein the first cleaning brush has a tapered first cleaning surface configured to come into contact with a bevel region on a side of one surface of the substrate held by the substrate rotation holding device,

wherein the second cleaning brush has a tapered second cleaning surface configured to come into contact with a bevel region on a side of another surface of the substrate held by the substrate rotation holding device,

wherein at least one of the first or second cleaning brushes further has a cylindrical third cleaning surface configured to come into contact with an end surface region of the substrate held by the substrate rotation holding device, and

the third cleaning surface is provided integrally with the first or second cleaning surface with the rotating shaft as its center.

23. The substrate cleaning device according to claim 22, further comprising a first cleaning liquid supplier that supplies a cleaning liquid onto the one surface of the substrate held by the substrate rotation holding device.

24. The substrate cleaning device according to claim 22, further comprising a second cleaning liquid supplier that supplies a cleaning liquid to the another surface of the substrate held by the substrate rotation holding device.